Quarter-micrometre Surface and Buried Channel PMOSFET Modelling for Circuit Simulation
YH Cheng,MC Jeng,ZH Liu,K Chen,B Yu,K Imai,CM Hu
DOI: https://doi.org/10.1088/0268-1242/11/12/001
IF: 2.048
1996-01-01
Semiconductor Science and Technology
Abstract:The modelling of PMOSFETs, with surface channels (SC) and buried channels (BC) down to deep quarter-micrometre, in BSIM (Berkeley short-channel IGFET model) is discussed for analogue/digital circuit simulation. Based on physical mobility, velocity saturation, threshold voltage and series drain/source resistance models with some special considerations for PMOSFETs, a unified I-V model describes the electrical characteristics of both NMOSFET and PMOSFETs, with surface channel and buried channel types. Because the model includes the major physical effects in state-of-the-art MOSFETs and contains many important process and geometry parameters, it can fit the measured data well and has a good scalability for both SC and BC PMOSFETs.