Two-dimensional numerical simulation of deep submicron thin-film SOI MOSFET

Xing Zhang,Yongquan Shi,Cheng Huang
1995-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:A two-dimensional simulator has been developed for thin film submicron and deep submicron SOI MOSFET. In order to improve the calculation efficiency, the dynamic method of two steps has been used to solve Poisson's equation and the current continuity equations for electrons and holes. The differences between the characteristics and working mechanisms of thin film SOI MOSFET and thick film SOI MOSFET have been analyzed by the simulator. It was found that almost all of the characteristics of thin film deep submicron SOI MOSFET have been improved. The simulation results are in agreement with experimental result.
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