Study of Monocrystalline CdTe films grown by ICB epitaxy

Jiayou Feng,FangWei Zhang,Yudian Fan,Hengde Li
1994-01-01
Abstract:Epitaxial films of CdTe were grown on NaCl(100) and Si(111) substrates by ionized cluster beam epitaxy. X-ray diffraction, electron channelling patterns and RHEED analyses indicated that good monocrystallinity and surface flatness have been achieved. The epitaxial orientation relationships are CdTe (100)//NaCl(100) and CdTe(111)//Si(111). It was found that, when substrate temperature is lower than 230��C, the structure of epitaxial films is a mixed cubic-hexagonal phase. The quality of the CdTe epilayer improves significantly with the increase of the kinetic energy of the CdTe clusters. The best CdTe epilayer grown on Si substrates exhibited a CdTe(111) DCRC having the FWHM of 11 arcm.
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