Physical properties of CdTe grown on Si by low pressure metalorganic chemical vapour deposition

Min-Shyong Lin,Rey-Lin Chou,Kan-Sen Chou
DOI: https://doi.org/10.1016/0022-0248(86)90339-8
IF: 1.8
1986-01-01
Journal of Crystal Growth
Abstract:Specular CdTe epitaxial layers have been grown on (100)Si substrates by low pressure metalorganic chemical vapour deposition method with dimethylcadmium (DMCd) and diethyltelluride (DETe) source materials. Scanning electron microscopy is used to demonstrate the good surface morphology. Hall measurements show that all grown CdTe crystals are n-type with carrier concentrations of about 6×1017 cm−3 and mobilities in the range of 500–700 cm2/V·s at room temperature. Deep level transient spectroscopy has been used to study the defect levels existing in the interface of the heterojunction, and four levels Ec −0.25, 0.34, 0.44 and 0.76 eV are investigated. 14 K photoluminescence spectra show dominant sharp bound exciton related emission peak at 1.593 eV and the weak defect related extrinsic band at 1.483 eV. The intensity of 1.483 eV is enhanced with the increase of the DMCd/DETe mole ratio and the VTe-related or Cdi-related complexes are tentatively suggested for this emission band. All results indicated that the high quality CdTe epitaxial layers can be grown on (100) Si.
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