Effect of Boron-doping and annealing on the structure, morphological and optical properties of ZnO films prepared by spray pyrolysis method
Sameerah S.S. Al-Qadasy,Hakim Q.N.M. Al- Arique,Nabeel M.S. Kawash,S.Q. Chishty,Kashinath Arjun Bogle
DOI: https://doi.org/10.1088/1402-4896/ad4b73
2024-05-16
Physica Scripta
Abstract:Investigations have been conducted into the structure, morphology, thickness, and optical properties of ZnO thin film upon doping it with Boron from boric acid (H3BO3) at a constant concentration and annealing it at various temperatures (200, 300, and 400 °C). The thin films were formed on glass substrates using the spray pyrolysis process at 250°C, and they were then annealed for two hours in air at various temperatures. It was discovered that the annealing temperature and boron doping had a substantial impact on all properties of the ZnO nanostructure. The polycrystalline hexagonal wurtzite structure is present in both ZnO and BZO thin films. With high optical transmission (≥70%), crystallite diameters of 25.8 to 28.5 nm for ZnO and 15.96 to 24.80 nm for BZO, respectively, and significant absorbance up to 400 nm at the maximum annealing temperature (400 °C) for both films. Moreover, the as-deposited and annealed BZO films had optical band gaps of 3.04 eV and 2.9 eV, respectively, which are less than the ZnO film's 3.23 eV band gap; in general, as the annealing temperature increased it decreased.
physics, multidisciplinary