Abstract:This paper explores a low standby power 10T (LP10T) SRAM cell with high read stability and write-ability (RSNM/WSNM/WM). The proposed LP10T SRAM cell uses a strong cross-coupled structure consisting standard inverter with a stacked transistor and Schmitt-trigger inverter with a double-length pull-up transistor. This along with the read path separated from true internal storage nodes eliminates the read-disturbance. Furthermore, it performs its write operation in pseudo differential form through write bitline and control signal with a write-assist technique. To estimate the proposed LP10T SRAM cell’s performance, it is compared with some state-of-the-art SRAM cells using HSPICE in 16-nm CMOS predictive technology model at 0.7 V supply voltage under harsh manufacturing process, voltage, and temperature variations. The proposed SRAM cell offers 4.65X/1.57X/1.46X improvement in RSNM/WSNM/WM and 4.40X/1.69X narrower spread in RSNM/WM compared to the conventional 6T SRAM cell. Furthermore, it shows 1.26X/1.08X/1.01X higher RSNM/WSNM/WM and 1.71X/1.25X tighter/wider spread in RSNM/WM compared to the best studied SRAM cells. The proposed SRAM cell indicates 74.48%/1.41% higher/lower read/write delay compared to the 6T SRAM cell. Moreover, it exhibits the third-(second-) best read (write) dynamic power, consuming 29.69% (26.87%) lower than the 6T SRAM cell. The leakage power is minimized by the proposed design, which is 37.35% and 12.08% lower than that of the 6T and best studied cells, respectively. Nonetheless, the proposed LP10T SRAM cell occupies 1.313X higher area compared to the 6T SRAM cell.

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