Thermal Stability of Wetting Layer in Quantum Dot Self-Assembly

Y. Y. Cao,G. W. Yang
DOI: https://doi.org/10.1063/1.4712627
IF: 2.877
2012-01-01
Journal of Applied Physics
Abstract:A quantitative thermodynamic theory was established to address the thermal stability of the wetting layer (WL) in quantum dot (QD) self-assembly by introducing a thermal effect based on statistical mechanics. It was found that the thickness of the WL is related to the growth temperature, and the critical temperature deduced by the QD potential energy can be the QD thermal stability dividing line. The agreement between theoretical results and experiments implies that the established approach is expected to contribute to the understanding and design of QD self-assembly.
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