Abstract:Lithography techniques are currently being developed to fabricate nanoscale components for integrated circuits, medical diagnostics and optoelectronics 1 , 2 , 3 , 4 , 5 , 6 , 7 . In conventional far-field optical lithography, lateral feature resolution is diffraction-limited 8 . Approaches that overcome the diffraction limit have been developed 9 , 10 , 11 , 12 , 13 , 14 , but these are difficult to implement or they preclude arbitrary pattern formation. Techniques based on near-field scanning optical microscopy can overcome the diffraction limit, but they suffer from inherently low throughput and restricted scan areas 15 , 16 , 17 . Highly parallel two-dimensional, silicon-based, near-field scanning optical microscopy aperture arrays have been fabricated 18 , but aligning a non-deformable aperture array to a large-area substrate with near-field proximity remains challenging. However, recent advances in lithographies based on scanning probe microscopy have made use of transparent two-dimensional arrays of pyramid-shaped elastomeric tips (or ‘pens’) for large-area, high-throughput patterning of ink molecules 19 , 20 , 21 , 22 , 23 . Here, we report a massively parallel scanning probe microscopy-based approach that can generate arbitrary patterns by passing 400-nm light through nanoscopic apertures at each tip in the array. The technique, termed beam pen lithography, can toggle between near- and far-field distances, allowing both sub-diffraction limit (100 nm) and larger features to be generated.

213 Nm Pitch Standards Fabricated Using Atomic Lithography

Grating Pitch Comparator Traceable to the Cr Atom Transition Frequency

Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Fabrication of 5 Nm Linewidth and 14 Nm Pitch Features by Nanoimprint Lithography

Nanofabrications Using A Laser Collimated And Focused Neutral Chromium Atom Beam

Nano-fabrication System Based on Atomic Force Microscopy

A new method to calibrate an atomic force microscope with the self-traceable chromium grating fabricated by atomic lithography

Atom lithography without laser cooling

Nano-Machined Transmission Gratings For Atom Interferometer Gyroscope Applications

Nanoscale molecular patterns fabricated by using scanning near-field optical lithography.

A Novel Technology to Fabricate the Arbitrary Nanopattern

Matching the Resolution of Electron Beam Lithography by Scanning Near-Field Photolithography

Thermal Lithography for 100-Nm Dimensions Using a Nano-Heat Spot of a Visible Laser Beam

Towards Large Scale Atomic Manufacturing: Heterodyne Grating Interferometer with Zero Dead-Zone

Fabrication of nanoscale to microscale 2.5D square patterns on metallic films by the coupling AFM lithography

6 Nm Half-Pitch Lines and 0.04 Μm2static Random Access Memory Patterns by Nanoimprint Lithography

On the reproducibility of electron-beam lithographic fabrication of photonic nanostructures

Beam Pen Lithography.

Investigations on tip-based large area nanofabrication and nanometrology using a planar nanopositioning machine (NFM-100)

Nanometer displacement measurement based on metrological self-mixing grating interferometer traceable to the pitch standard of one-dimension chromium self-traceable grating

Combining Double Patterning with Self-Assembled Block Copolymer Lamellae to Fabricate 10.5 Nm Full-Pitch Line/space Patterns