A new method to calibrate an atomic force microscope with the self-traceable chromium grating fabricated by atomic lithography

Zhenjie Gu,Xiao Deng,Yanni Cai,Xinpan Wang,Feng Yang
DOI: https://doi.org/10.1117/12.2585428
2020-12-04
Abstract:The error calibration of the nonlinearity of atomic force microscope (AFM) is the critical step to assure the accuracy during the measurement of microscale structure. In this paper, a new method to calibrate the atomic force microscope is proposed, which is based on the one dimensional self-traceable Chromium nanometre length reference material fabricated by the technique of atomic lithography. The pattern of the Cr grating measured by the metrological AFM present that the pitch is 212.8 nm and the accuracy of the pitch is better than 0.1nm. The number of its pitch is obtained by the centroid method on the data of the grating pattern. The nonlinearity of the commercial AFM is calibrated in the way of measuring the mean pitch of the Cr grating under the several different micron scale. This work offers a flexible solution for calibrating the AFM and meet the calibration need in the activity of nanometre fabrication
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