Abstract:Nanoscale measurement is an essential task of nanomanufacturing, and measurement traceability is a fundamental aspect of nanoscale measurement. High-precision nanoscale measurement instruments (e.g. Atomic Force Microscopes (AFM) and Scanning Electron Microscopes (SEM)) need to be calibrated by traceable standards to ensure their accuracy and reliability. However, due to the suboptimal accuracy, uniformity, and consistency of existing standards, they need to be calibrated by metrological instruments traceable to primary length standards (e.g. physical wavelength standards) before use. This results in a long traceability chain that leads to error accumulation and significantly reduces calibration efficiency. This paper proposes a novel shortened and simplified traceability chain, where the physical wavelength standard corresponding to the 7 S 3 → 7 P 4 0 transition frequency of chromium atoms is materialized into self-traceable gratings using the atom lithography technology. The self-traceable gratings can then be directly applied for calibrating measurement instruments. To verify this approach, the self-traceable gratings are calibrated using a metrological AFM of the Physikalisch-Technische Bundesanstalt. Measurement results confirmed the feasibility of the approach. Particularly, our results show that the self-traceable gratings have excellent uniformity over different measurement areas and consistency over different samples, both at 0.001 nm level. Finally, the application of the self-traceable gratings for the calibrations of a commercial AFM and SEM is demonstrated. The new traceability chain significantly simplifies the calibration process, providing a more reliable and higher efficient calibration approach for advanced nanomanufacturing than that of the state-of-the-art.

Calibrate the Non-Orthogonal Error of AFM with Two-Dimensional Self-Traceable Grating.

One-Dimensional Angle Measurement Error Calibration Technique for Fiber Optic Gyroscope

A new method to calibrate an atomic force microscope with the self-traceable chromium grating fabricated by atomic lithography

High Accuracy Calibration Method for Multi-Line Structured Light Three-Dimensional Scanning Measurement System Based on Grating Diffraction.

Aberration Calibration in High-Na Spherical Surfaces Measurement on Point Diffraction Interferometry

Optimization and Fabrication of Chromium Grating in Self-Traceable Interferometer

Calibration of the Effective Spring Constant of Ultra-Short Cantilevers for A High-Speed Atomic Force Microscope

Calibration for the Errors Resulted from Aberration in Long Focal Length Measurement

Shortened and simplified traceability chain for dimensional metrology based on self-traceable standards

Two-dimensional Nanometer Scale Gratings Measurement by Metrological Atomic Force Microscope

Self-traceable angle standards with simplified traceability chain for dimensional metrology

A wide-range metrology AFM and its applications

Segmental Calibration for Commercial AFM in Vertical Direction

Accurate measurement of orthogonality of equal-period, two-dimensional gratings by an interferometric method

Measurement of microscope calibration standards in nanometrology using a metrological atomic force microscope

Dual imaging-unit atomic force microscope for nanometer order length metrology based on reference scales

A Method to Calibrate Accelerometers by Laser Self-Mixing Self-Traceable Grating Interferometry

Position Measuring System in Metrological Atomic Force Microscope

Sub-Nanometer Misalignment Aberrations Calibration of the Fizeau Interferometer for High-Numerical-Aperture Spherical Surface Ultra-Precision Measurement

Nanometer displacement measurement based on metrological self-mixing grating interferometer traceable to the pitch standard of one-dimension chromium self-traceable grating

Lateral force calibration for atomic force microscope cantilevers using a suspended nanowire