Chromium Self-Traceable Length Standard: Investigating Geometry and Diffraction for Length Traceability Chain

Zichao Lin,Yulin Yao,Zhangning Xie,Dongbai Xue,Tong Zhou,Zhaohui Tang,Lihua Lei,Tao Jin,Xiong Dun,Xiao Deng,Xinbin Cheng,Tongbao Li

2023-06-25

Abstract:Natural constant-based metrology methods offer an effective approach to achieving traceability in nanometric measurements. The Cr grating, fabricated by atom lithography and featuring a pitch of $d=212.7705\pm0.0049~{\rm nm}$ traceable to the Cr transition frequency $^{7}S_{3}$ $\rightarrow$ $^{7}P_{4}^{0}$, demonstrates potential as a self-traceable length standard in nano-length metrology by grating interferometer. This research aims to analyze and engineer the diffraction characteristics that enhance the Cr grating as a self-traceable length standard within the length traceability chain based on the Cr transition frequency. Accordingly, we investigate the geometric morphology and diffraction characteristics of the Cr grating, analyzes the influence of the grating's polarization-sensitive characteristics on the Littrow configuration grating interferometer, and establishes the criteria for Cr grating fabrication. Experimentally, we fabricate an expanded Cr grating by scanning atom lithography, characterize its diffraction performance, and conduct preliminary verification of length measurement in a self-traceable grating interferometer. This work adheres to the international trend of flattened metrology development, offering a valuable reference for advancing subsequent metrological technologies throughout the new traceability chain.

Instrumentation and Detectors,Optics

What problem does this paper attempt to address?

### Problems the Paper Aims to Solve

This paper aims to analyze and optimize the geometry and diffraction characteristics of chromium gratings (Cr grating) to make them self-referencing length standards in a new traceability chain based on Cr transition frequencies. Specifically:

1. **Geometric Analysis**: The bidirectional Gaussian distribution characteristics of Cr gratings were studied, and the distribution of their diffraction characteristics was obtained.
2. **Polarization Insensitivity**: It was demonstrated that in a Littrow configuration grating interferometer, Cr gratings need to have polarization insensitivity to achieve optimal performance, and the direction for Cr grating preparation was established.
3. **Experimental Verification**: An extended Cr grating was prepared using scanning atom lithography technology, its morphological characteristics were characterized, its diffraction characteristics were measured, and preliminary verification was conducted in a self-referencing grating interferometer.

This study aligns with the trend of directly reproducing natural constants following the reform of the International System of Units (SI), providing an important reference for the development of metrology technology in the new traceability chain. However, due to the limitations of the atom lithography experimental mechanism, a polarization-insensitive Cr grating has not yet been successfully prepared, and the sample still has issues with peak-to-valley height (PTVH) non-uniformity. Future research needs further exploration and improvement.