Electric Fatigue Properties of Pb(Zr,Ti)O-3 Thin Films Grown on Lanio3 Buffer Pt/Ti/Sio2/Si Substrate by Metalorganic Chemical Vapor Deposition

JW Zhai,X Yao,ZK Xu,HD Chen
DOI: https://doi.org/10.1080/10584580500413251
2005-01-01
Integrated Ferroelectrics
Abstract:Ferroelectric Pb(Zr,Ti)O 3 thin films were deposited by metalorganic chemical vapor deposition (MOCVD) on LaNiO 3 -buffered Pt/Ti/SiO 2 /Si substrates. The highly (100)-oriented LaNiO 3 buffer layer facilitated the formation of high quality PZT films with a strong (100) preferred orientation. These films showed improved electric fatigue properties than those grown on Pt/Ti/SiO 2 /Si substrates. Thickness dependence of the ferroelectric properties has been observed with thickness ranging from 25 nm to 200 nm. Ferroelectric properties of PZT with different thickness, in its initial state and after voltage cycling that causes polarization fatigue, is studied by C-F and I-V measurements. The experiments revealed thickness dependence of the ferroelectric properties of both fatigued and unfatigued PZT films.
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