Structures and Properties of Pb(Zr,Ti)O3thin Films by Metallo-Organic Compound Decomposition Process

W Ren,XQ Wu,LY Zhang,X Yao
DOI: https://doi.org/10.1080/00150199708260536
1997-01-01
Ferroelectrics
Abstract:Structures and properties of Pb(Zr0.5Ti0.4)O-3 thin films by metallo-organic compound decomposition (MOD) process have been investigated. PZT thin films with thickness of 0.6 mu m were deposited by repeating spin-coating precursor solutions and thermal annealing steps on sapphires and (111) Si wafers with or without an Al2O3 buffer layer and a bottom platinum electrode. The structures and morphologies of the PZT films are affected strongly by thermal treatment and substrates. PZT films have good dielectric-frequency characteristics, and their dielectric constant and loss tangent are 480 and 1.1% at 1 kHz respectively. PZT films with remnant polarization Pr of 11.4 mu C/cm(2) and coercive field Ec of 80 kV/cm have been obtained.
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