Silicon-On-Insulator Power Integrated Circuits

DM Garner,F Udrea,HT Lim,G Ensell,AE Popescu,K Sheng,WI Milne
DOI: https://doi.org/10.1016/s0026-2692(01)00024-6
IF: 1.992
2001-01-01
Microelectronics Journal
Abstract:A power integrated circuit process has been developed, based on silicon-on-insulator, which allows intelligent CMOS control circuitry to be placed alongside integrated high-voltage power devices. A breakdown voltage of 335V has been obtained by using a silicon layer of 4μm thickness together with a buried oxide layer of 3μm thickness. The respective LDMOS specific on-resistance and LIGBT on-state voltage for this breakdown voltage were 148mΩcm2 and 3.9V, respectively.
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