Membrane High Voltage Devices - A Milestone Concept In Power Ics

F Udrea,T Trajkovic,Gaj Amaratunga
DOI: https://doi.org/10.1109/IEDM.2004.1419185
2004-01-01
Abstract:We report for the first time a novel technology concept in Power ICs. We present detailed experimental data obtained during several years of development and demonstrate the application of the new technology in a range of highly efficient switch mode power supplies (SMPS). This technology is capable of delivering more than 3 times higher current density (30 A/cm(2)), and two to five times the switching speed (500 kHz for 650 V rated devices) of state-of-the-art power IC technologies such as Junction-Isolation or Silicon-on-Insulator. The new concept is based on merging of the MEMS and CMOS SOI technologies to increase the breakdown ability of the power device and reduce its output capacitance (1). The MEMS step is fully CMOS compatible and consists of a back-side deep reactive ion etching (DRIE) performed selectively in the drift region of the power device to realize multiple membranes of ultra-thin silicon-dielectric films.
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