Novel Designed SiC Devices for High Power and High Efficiency Systems

Yasuki Mikamura,Kenji Hiratsuka,Takashi Tsuno,Hisato Michikoshi,So Tanaka,Takeyoshi Masuda,Keiji Wada,Taku Horii,Jun Genba,Toru Hiyoshi,Takeshi Sekiguchi
DOI: https://doi.org/10.1109/ted.2014.2362537
IF: 3.1
2015-02-01
IEEE Transactions on Electron Devices
Abstract:Two types of 4H-silicon carbide (SiC) MOSFETs are proposed in this paper. One is the novel designed V-groove trench MOSFET that utilizes the 4H-SiC (0-33-8) face for the channel region. The MOS interface using this face shows the extremely low interface state density ( ${D}_{\mathrm {\mathbf {it}}}$ ) of $3\times 10^{11}$ $\mathrm{cm}^{-2}~\mathrm{eV}^{-1}$ , which causes the high channel mobility of 80 $\mathrm{cm}^{2}~\mathrm{V}^{-1}~\mathrm{s}^{-1}$ results in very low channel resistance. The buried p+ regions located close to the trench bottom can effectively alleviate the electric field crowding without the significant sacrifice of the increase of the resistance. The low specific ON-state resistance of 3.5 m $\Omega ~\mathrm{cm}^{\mathrm {\mathbf {2}}}$ with sufficiently high blocking voltage of 1700 V is obtained. The other is the double implanted MOSFET with the carefully designed junction termination extension and field-limiting rings for the edge termination region, and the additional doping into the junction FET region. With a high-quality and high-uniformity epitaxial layer, 6 mm $\times 6$ mm devices are fabricated. The well balanced specific ON-state resistance of 14.2 m $\Omega ~\mathrm{cm}^{2}$ and the blocking voltage of 3850 V are obtained for 3300 V application.
engineering, electrical & electronic,physics, applied
What problem does this paper attempt to address?