Abstract:Fluorite-structure binary oxides (e.g., HfO2 and ZrO2) have attracted increasing interest for a broad range of applications including thermal barrier coatings, high-k dielectrics, and novel ferroelectrics. A crystalline structure plays a crucial role in determining physical and chemical properties. Structure evolution of ZrO2 thin films, particularly down to the nanometer scale, has not been thoroughly studied. In this work, we carried out systematic annealing analysis on the ZrO2 thin films. Through in-situ high-temperature X-ray diffraction (XRD) characterizations, a thickness dependence of crystallization and phase transition is observed. Irrespective of the thickness (10-300 nm), the as-prepared amorphous ZrO2 thin films are preferentially crystallized into a tetragonal (t) structure (high-temperature phase), which can be preserved down to room temperature (RT) upon annealing at the corresponding crystallization temperature (TC). When annealing at temperatures higher than TC, the transition from t to monoclinic (m; RT phase) will occur, and the quantity of the transition strongly depends on the film thickness. Our work expands the basic understanding of the phase transition in the ZrO2 thin films, and offers a path to the selective control over the phase structure for novel functionalities.

Interfacial and microstructural properties of zirconium oxide thin films prepared directly on silicon

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

High-Quality ZrO2 Thin Films Deposited on Silicon by High Vacuum Electron Beam Evaporation

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Deposition of high k ZrO/sub 2/ thin films by high vacuum electron beam evaporation at room temperature

Deposition of high k ZrO2 thin films by high vacuum electron beam evaporation at room temperature

Infrared And Raman Spectroscopic Studies Of Optically Transparent Zirconia (Zro2) Films Deposited By Plasma-Assisted Reactive Pulsed Laser Deposition

X-ray Diffraction and Electrical Characterization of Photo-Cvd Zirconium Oxide Layers

Structure and Thermal Stability of (zr0.6al0.4)o1.8 Thin Film on Strained SiGe Layer

Growth of Zirconium Silicide Nanostructures on Vicinal and Flat Si(111)-7 × 7 Surfaces

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Excimer UV-assisted preparation of zirconium silicate layers

Growth and characterisation of zirconia surfaces on Cu(111)

Unveiling the feature of deposition of oxygen and water molecules on the zirconium surface: A molecular dynamic study

Pulsed Laser Deposition of Zirconium Silicate Thin Films As Candidate Gate Dielectrics

Microstructure and Electrical Properties of Al2O3–ZrO2 Composite Films for Gate Dielectric Applications

Study on the thermal stability and electrical properties of the high- k dielectrics (ZrO 2 ) x (SiO 2 ) 1− x

Thickness Dependence of the Crystallization and Phase Transition in ZrO 2 Thin Films

Synthesis and Characterization of HfO2 and ZrO2 Thin Films Deposited by Plasma Assisted Reactive Pulsed Laser Deposition at Low Temperature

Interfacial Properties of High-K Dielectric Cazrox Films Deposited by Pulsed Laser Deposition