Low-temperature formation of nanocrystalline β-SiC with high surface area and mesoporosity via reaction of mesoporous carbon and silicon powder
Zhicheng Liu,Weihua Shen,Wenbo Bu,Hangrong Chen,Zile Hua,Lingxia Zhang,Lei Li,Jianlin Shi,Shouhong Tan
DOI: https://doi.org/10.1016/j.micromeso.2005.02.022
IF: 5.876
2005-01-01
Microporous and Mesoporous Materials
Abstract:We report here a new route to prepare nanocrystalline β-silicon carbide with high specific surface areas and mesoporosity. The preparation method was via the reaction of ordered mesoporous carbons (OMCs, carbon replicas of MCM-48, SBA-15 and KIT-6) with silicon powder at the temperature of 1200–1300°C, which is below the melting point of silicon, 1420°C. The SiC samples were characterized by XRD, SEM, TEM, N2 adsorption and other techniques, which showed that the SiC samples were nanocrystalline and had a high surface area of up to 147m2g−1 and a mesoporosity in the range of 5–40nm. In addition, the silicon vapor infiltration method at a temperature beyond 1420°C was also brought into comparison.