Surface Microstructure of Porous Silicon Prepared by Electrochemical Etching

LIANG Ji-ran,HU Ming,DOU Yan-wei
DOI: https://doi.org/10.3969/j.issn.1672-6030.2006.02.017
2006-01-01
Nanotechnology and Precision Engineering
Abstract:The surface microstructure of porous silicon is important for the performance of components in micro-electron mechanical systems ( MEMS). Porous silicon layers are prepared by electrochemical etching with different current density and time in double cell. Atomic force microscopy(AFM) and field emission scanning electron microscopy(FESEM) are used to investigate the morphologies of porous silicon. The results show that;in the initial stage, silicon poles are formed,its diameter, height and distribution are directly proportinal to the current density;silicon poles are dissolved in the etching process, and the roughness firstly reduces then increases , in the end, reaches an invariable value of 0.52 nm; the value range of pore diameter becomes smaller with etching time increasing.
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