Device-grade A-Sige:H Alloys Prepared by Nanometer Deposition/h2 Plasma Annealing Method

J Xu,K Shiba,S Miyazaki,M Hirose,KJ Chen,D Feng
DOI: https://doi.org/10.1016/0022-3093(95)00767-9
IF: 4.458
1996-01-01
Journal of Non-Crystalline Solids
Abstract:Hydrogenated amorphous silicon-germanium (a-SiGe:H) alloys are fabricated by alternately repeating a 3 nm thick a-SiGe:H deposition and subsequent hydrogen plasma annealing at various rf power densities and substrate temperatures. The bonded-hydrogen content decreases with increasing rf power density or substrate temperature. It is found that the hydrogen-annealed films with an optical bandgap of 1.45-1.52 eV exhibit high photoconductivity (> 10(-5) S/cm) under AM1 light (100 mW/cm(2)) illumination and high photosensitivity (> 10(4)). A significant reduction of the gap states due to the hydrogen annealing is also suggested from the luminescence properties as well as the substitutional doping efficiency.
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