Pseudo-Capacitive Behavior of Three-Dimensional Ruthenium Oxide Microelectrode Prepared by MEMS Technology

Wen Chunming,Wen Zhiyu,You Zheng,Wang Xiaofeng
DOI: https://doi.org/10.13494/j.npe.2013.014
2013-01-01
Nanotechnology and Precision Engineering
Abstract:To enhance the charge storage capacity of the electrode in unit floor area,high aspect ratio three-dimensional microelectrode structures were prepared by MEMS technology to increase the electrode surface area,and functional membranes were fabricated on the structures.The three-dimensional microelectrode structures were made by SU-8 photoresist on the silicon wafer,and gold was sputtered on the structure as a current collector.Ruthenium oxide as electroactive material was electroplated on the three-dimensional microelectrode structure surface with the square pulse electro-deposition method in two-electrode system.The microelectrode surface morphology and composition were characterized by scanning electron microscopy and energy dispersive spectroscopy.Electrochemical properties of microelectrode were tested by cyclic voltammetry.It is found that the specific capacitance of the three-dimensional microelectrode is 0.79 F/cm2.
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