Fabrication of the Patterned Sapphire Substrate by the Imprint Lithography with the Flexible Hybrid Mold

Song Baosheng,Lin Liang,Dai Ming,Xu Yelong,Lu Minghui
DOI: https://doi.org/10.3969/j.issn.1671-4776.2013.09.008
2013-01-01
Abstract:Patterned sapphire substrate(PSS) is of great significance for the enhancement of the internal quantum efficiency and light extraction efficiency for the LED.The imprint lithography with the flexible hybrid mold utilized to fabricate the PSS was researched.The fabrication processes mainly include three pattern transfer steps.Firstly,a SiO2 layer was deposited on a sapphire substrate,and then the curable resist was spin-coated on it.The UV curable imprint lithography technology was used to realize the pattern transfer from the mold to the curable resist.Secondly,the SiO2 layer was etched by the inductively coupled plasma etching,and patterns were formed on the SiO2 layer.With the SiO2 layer as a mask layer,the sapphire substrate was etched by wet etching.Finally,the PSS was obtained after removing the SiCX layer.As shown in the experiment,the photoluminescence intensity of the LED grown on the PSS fabricated by the nanoim-print lithography with the flexible hybrid mold is obviously improved compared with that of the LED on a sapphire substrate without patterns.
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