Fabrication of Nano-Patterned Sapphire Substrates by Combining Nanoimprint Lithography with Edge Effects

Yiyong Chen,Zhizhong Chen,Shengxiang Jiang,Chengcheng Li,Yifan Chen,Jinglin Zhan,Xiangning Kang,Fei Jiao,Guoyi Zhang,Bo Shen

DOI: https://doi.org/10.1039/c8ce01058g

IF: 3.756

2019-01-01

CrystEngComm

Abstract:A volcano-shaped nano-patterned sapphire substrate fabricated by combining nanoimprint lithography with edge effects.

What problem does this paper attempt to address?

Fabrication of Volcano-Shaped Nano-Patterned Sapphire Substrates Using Colloidal Self-Assembly and Wet Chemical Etching

Chong Geng,Lu Zheng,Huajing Fang,Qingfeng Yan,Tongbo Wei,Zhibiao Hao,Xiaoqing Wang,Dezhong Shen

DOI: https://doi.org/10.1088/0957-4484/24/33/335301

IF: 3.5

2013-01-01

Nanotechnology

Abstract:Patterned sapphire substrates (PSS) have been widely used to enhance the light output power in GaN-based light emitting diodes. The shape and feature size of the pattern in a PSS affect its enhancement efficiency to a great degree. In this work we demonstrate the nanoscale fabrication of volcano-shaped PSS using a wet chemical etching approach in combination with a colloidal monolayer templating strategy. Detailed analysis by scanning electron microscopy reveals that the unique pattern shape is a result of the different corrosion-resistant abilities of silica masks of different effective heights during wet chemical etching. The formation of silica etching masks of different effective heights has been ascribed to the silica precursor solution in the interstice of the colloidal monolayer template being distributed unevenly after infiltration. In the subsequent wet chemical etching process, the active reaction sites altered as etching duration was prolonged, resulting in the formation of volcano-shaped nano-patterned sapphire substrates.
Study on the Morphology and Shape Control of Volcano-Shaped Patterned Sapphire Substrates Fabricated by Imprinting and Wet Etching

S. X. Jiang,Z. Z. Chen,X. Z. Jiang,X. X. Fu,S. Jiang,Q. Q. Jiao,T. J. Yu,G. Y. Zhang

DOI: https://doi.org/10.1039/c4ce02452d

IF: 3.756

2015-01-01

CrystEngComm

Abstract:A novel method based on imprinting lithography and wet etching to fabricate a volcano-shaped patterned sapphire substrate (VPSS) is presented.
Large-scale Fabrication of Nanopatterned Sapphire Substrates by Annealing of Patterned Al Thin Films by Soft UV-nanoimprint Lithography

Lin Cui,Gui-Gen Wang,Hua-Yu Zhang,Jie-Cai Han,Xu-Ping Kuang,Ji-Li Tian,Rui Sun

DOI: https://doi.org/10.1186/1556-276x-8-472

2013-01-01

Nanoscale Research Letters

Abstract:Large-scale nanopatterned sapphire substrates were fabricated by annealing of patterned Al thin films. Patterned Al thin films were obtained by soft UV-nanoimprint lithography and reactive ion etching. The soft mold with 550-nm-wide lines separated by 250-nm space was composed of the toluene-diluted polydimethylsiloxane (PDMS) layer supported by the soft PDMS. Patterned Al thin films were subsequently subjected to dual-stage annealing due to the melting temperature of Al thin films (660°C). The first comprised a low-temperature oxidation anneal at 450°C for 24 h. This was followed by a high-temperature annealing in the range of 1,000°C and 1,200°C for 1 h to induce growth of the underlying sapphire single crystal to consume the oxide layer. The SEM results indicate that the patterns were retained on sapphire substrates after high-temperature annealing at less than 1,200°C. Finally, large-scale nanopatterned sapphire substrates were successfully fabricated by annealing of patterned Al thin films for 24 h at 450°C and 1 h at 1,000°C by soft UV-nanoimprint lithography.
Fabrication of Wafer-Scale Nanopatterned Sapphire Substrate by Hybrid Nanoimprint Lithography

Xu Guo,Jing Hu,Zhe Zhuang,Mengmeng Deng,Feixiang Wu,Xie Li,Bin Liu,Changsheng Yuan,Haixiong Ge,Feng Li,Yanfeng Chen

DOI: https://doi.org/10.1116/1.4898778

2014-01-01

Abstract:A hybrid nanoimprint soft lithography (HNSL) technique was used to fabricate nanopatterned sapphire substrates (NPSSs) for light-emitting diodes (LEDs). HNSL combines the high resolution of nanoimprint lithography (NIL) and the conformal contact of soft lithography. The key component of HNSL is the hybrid mold, which consists of rigid nanopatterns with an anti-adhesion coating on an elastic poly(dimethylsiloxane) support. The mold was used to fabricate nanopatterns on a 2-in. sapphire substrate through a soft UV-NIL system with a double-layer resist, a top UV-curable layer, and an underlying PMMA layer. Nickel dot arrays were formed from the imprinted patterns through a lift-off process and used as the etching mask during the sapphire etching process due to nickel's high etching resistance. A wafer-scale circular-truncated-cone shaped NPSS was achieved by chlorine-based inductively coupled plasma etching. Typical blue LEDs with emission wavelengths of 452 nm were grown by metal-organic chemical vapor deposition on the NPSS and a flat sapphire substrate (FSS), respectively. The integral electroluminescence intensity and light output power of the NPSS LED were enhanced by 57.9% and 43.8%, respectively, compared to the FSS LED. The high uniformity in photoluminescence intensity across the entire NPSS LED wafer indicated good uniformity of nanopatterns fabricated by HNSL. Low cost and availability of the process and the ability to fabricate at the wafer scale make HNSL a promising method for production of NPSSs.
Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Yujie Zhan,Liangui Deng,Wei Dai,Yongxue Qiu,Shicheng Sun,Dizhi Sun,Bowen Hu,Jianguo Guan

DOI: https://doi.org/10.3390/nano14120998

2024-06-08

Abstract:Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro-nano optics, flexible electronics, optical communication, and biomedicine studies.
Fabrication of Wafer-Scale Nanopatterned Sapphire Substrate Through Phase Separation Lithography

Xu Guo,Mengyang Ni,Zhe Zhuang,Jiangping Dai,Feixiang Wu,Yushuang Cui,Changsheng Yuan,Haixiong Ge,Yanfeng Chen

DOI: https://doi.org/10.1007/s00339-016-9933-x

2016-01-01

Abstract:A phase separation lithography (PSL) based on polymer blend provides an extremely simple, low-cost, and high-throughput way to fabricate wafer-scale disordered nanopatterns. This method was introduced to fabricate nanopatterned sapphire substrates (NPSSs) for GaN-based light-emitting diodes (LEDs). The PSL process only involved in spin-coating of polystyrene (PS)/polyethylene glycol (PEG) polymer blend on sapphire substrate and followed by a development with deionized water to remove PEG moiety. The PS nanoporous network was facilely obtained, and the structural parameters could be effectively tuned by controlling the PS/PEG weight ratio of the spin-coating solution. 2-in. wafer-scale NPSSs were conveniently achieved through the PS nanoporous network in combination with traditional nanofabrication methods, such as O2 reactive ion etching (RIE), e-beam evaporation deposition, liftoff, and chlorine-based RIE. In order to investigate the performance of such NPSSs, typical blue LEDs with emission wavelengths of ~450 nm were grown on the NPSS and a flat sapphire substrate (FSS) by metal–organic chemical vapor deposition, respectively. The integral photoluminescence (PL) intensity of the NPSS LED was enhanced by 32.3 % compared to that of the FSS-LED. The low relative standard deviation of 4.7 % for PL mappings of NPSS LED indicated the high uniformity of PL data across the whole 2-in. wafer. Extremely simple, low cost, and high throughput of the process and the ability to fabricate at the wafer scale make PSL a potential method for production of nanopatterned sapphire substrates.
Fabrication of the Patterned Sapphire Substrate by the Imprint Lithography with the Flexible Hybrid Mold

Song Baosheng,Lin Liang,Dai Ming,Xu Yelong,Lu Minghui

DOI: https://doi.org/10.3969/j.issn.1671-4776.2013.09.008

2013-01-01

Abstract:Patterned sapphire substrate(PSS) is of great significance for the enhancement of the internal quantum efficiency and light extraction efficiency for the LED.The imprint lithography with the flexible hybrid mold utilized to fabricate the PSS was researched.The fabrication processes mainly include three pattern transfer steps.Firstly,a SiO2 layer was deposited on a sapphire substrate,and then the curable resist was spin-coated on it.The UV curable imprint lithography technology was used to realize the pattern transfer from the mold to the curable resist.Secondly,the SiO2 layer was etched by the inductively coupled plasma etching,and patterns were formed on the SiO2 layer.With the SiO2 layer as a mask layer,the sapphire substrate was etched by wet etching.Finally,the PSS was obtained after removing the SiCX layer.As shown in the experiment,the photoluminescence intensity of the LED grown on the PSS fabricated by the nanoim-print lithography with the flexible hybrid mold is obviously improved compared with that of the LED on a sapphire substrate without patterns.
Nano-Patterns Fabricated by Soft Press and Temperature-Pressure Variation Imprint

Lei Wang,Wen Liu,Yiwen Zhang,Fei Qiu,Dingli Wang,Ning Zhou,Zhimou Xu

DOI: https://doi.org/10.1117/12.867573

2010-01-01

Abstract:Nano-devices are increasingly required, the fabrication cost of nano-devices is quite high due to high resolution requirement. Nanoimprint lithography(NIL) is a promising technology for nano devices fabrication due to its low cost and high resolution. However, it still suffers from the large area uniformity and imprint defects problems. Herein, temperature-pressure variation soft press process are used in Simultaneous Thermal and UV (STU) imprint to enhance the uniformity and quality of pattern. This method is used to pattern high quality photonic crystals and gratings.
Fabrication of 2D silicon nano-mold by side etch lift-off method

Ran Guo,Liping Qi,Liang Xu,Lingpeng Liu,Lei Sun,Zhifu Yin,Kehong Li,Helin Zou

DOI: https://doi.org/10.1088/1361-6528/abf50e

IF: 3.5

2021-04-20

Nanotechnology

Abstract:Abstract Nano-imprint technology is a method of nano-pattern reproduction, has the characteristics of high resolution, high throughput, and low-cost. It can reduce the complexity and cost of the equipment while improving the resolution, which considered a promising industrial production technology. The key to nanoimprinting lies in the mold, and the quality of the mold directly determines the quality of the imprinted graphics. Here, a method for fabricating sub-100 nm concave 2D silicon nano-mold by side etch lift-off is proposed. The effects of different wet etching time and the metal deposition angle on the width of nanochannels were studied. The measurement result of dry etching shows that on the entire 4 inch silicon wafer, the width of the nanochannel varies by 4% and the depth by 2%. The width of the nanochannel between chips varies by 0.7%, and the depth variation is 1%. With this new method, high-precision and large-scale silicon nano-mold can be produced, which has great potential for realizing high-precision and low-cost manufacturing of nano devices.

materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
Effect of exposure parameters and annealing on the structure and morphological properties of nanopatterned sapphire substrates prepared by solid state reaction

Cui Lin,Wang Gui-Gen,Zhang Hua-Yu,Han Jie-Cai

DOI: https://doi.org/10.1016/j.ceramint.2013.09.016

IF: 5.532

2014-01-01

Ceramics International

Abstract:Nanopatterned sapphire substrates were prepared by solid state reaction of patterned Al films obtained by E-Beam lithography of a PMMA/copolymer bilayer resist and lift-off. The effect of exposure parameters and annealing on the structure and morphological properties of nanopatterned sapphire substrates prepared by solid state reaction were investigated by a scanning electron microscope (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and Raman, respectively. The circular Al patterns with diameter/spacing being 500 nm/1000 nm were obtained by optimal exposure diameter/exposure dosage of 400 nm/200 μC/cm2. Patterned Al films were subsequently subjected to solid state reaction by dual stage annealing due to the melting temperature of Al thin films (660 C). The hillocks formation on Al films was minimized with an oxidation anneal at 450 C. Moreover, the little change in the morphology of Al patterns was observed after annealing at 450 C. The SEM and AFM results show the patterns were retained on sapphire substrates after high temperature annealing at less than 1200 C. The XRD and Raman results reveal that the composition and orientation of island patterns prepared by solid state reaction for 24 h at 450 C, and 1 h 1000 C were the same as that of the sapphire (0001) substrates. © 2013 Elsevier Ltd and Techna Group S.r.l.
Unconventional Lithography for Patterned Nanomaterials

Yue Li,Qingfeng Yan,Naoto Koshizaki

DOI: https://doi.org/10.1088/1361-6528/aa98a2

IF: 3.5

2017-01-01

Nanotechnology

Abstract:Patterned nanostructure materials have important applications in photonic crystals, SERS, micro / nanodevices etc [ 1 ] . Conventional nanofabrication technologies for the patterned nanostructures mainly rely on semiconductor micromachining techniques, such as photo and electron beam lithography [ 2, 3 ] . Due to the light diffraction limit and poor throughput, these conventional lithography techniques are reaching their resolution limits and have relatively high costs. Unconventional lithography techniques including colloidal lithography [ 4, 5 ] , self-assembly [ 6, 7 ] etc. thus appear to meet increasing demand for nanofabrication with smaller features, lower cost and more complicated geometries. This focus collection introduces recent advances in unconventional lithography for understanding [ 8 ] . Imbraguglio and Perego et al developed a route to prepare periodic Si nanostructures based on diblock copolymer ( DBC ) masks and reactive ion etching ( RIE ) and investigated the in ﬂ uence of the feature size on the etch rate of Si [ 9 ] . The decrease of the etch depth and etch rate was observed in the mask with the smallest feature size. They transferred the nanometric cylindrical pattern in DBC into a Si substrate. They also investigated the structural and physicochemical in ﬂ uences on the resulting nanostructured Si in order to delineate of various RIE pattern effects. They successfully realized the sub 20 nm features on silicon substrate. Borah et al demonstrated an effective approach to fabricate nanoscale silicon patterns by transferring the PDMS cylindrical and spherical patterns to underlying silicon by an etching processes, which showed promise in guiding self-assembly and
A Method for Preparing Surface Sub-Microstructures on Sapphire Surfaces Using Femtosecond Laser Processing Technology

Kaixuan Wang,Jun Chen,Yubin Zhang,Qingzhi Li,Feng Tang,Xin Ye,Wanguo Zheng

DOI: https://doi.org/10.3390/coatings14040481

IF: 3.236

2024-04-15

Coatings

Abstract:Femtosecond laser processing technology is an advanced sub-micro-processing technique that enables the non-contact processing of various materials. This technology can be used to apply sub-micro structures for purposes such as hydrophilicity enhancement, optical transmittance improvement, and photonics detection. However, when it comes to processing micro/nanostructures on highly brittle materials using femtosecond lasers, there are challenges such as low processing efficiency, generation of debris, and microcracking. In this paper, we propose a method called the out-of-focus femtosecond laser direct writing technique combined with wet etching. This method offers simplicity, speed, and flexibility in preparing dense, large-area sub-microstructured surfaces on the brittle material sapphire. Our detailed investigation focuses on the impact of laser processing parameters (direct writing period, distance of focusing, direct writing speed, etc.) on the sub-microstructures of Al2O3 surfaces. The results demonstrate that this method successfully creates embedded sub-microstructures on the sapphire surface. The microholes, with a diameter of approximately 2.0 μm, contain sub-micro structures with a minimum width of 250 ± 20 nm. Additionally, we conducted experiments to assess the optical transmittance of sapphire nanostructures in the range of 350–1200 nm, which exhibited an average transmittance of approximately 77.0%. The water contact angle (CA) test yielded a result of 52 ± 2°, indicating an enhancement in the hydrophilicity of the sapphire nanostructures with only a slight reduction in optical transmittance. Our efficient fabrication of sub-microstructures on the sapphire surface of highly brittle materials offers a promising method for the production and application of brittle materials in the field of micro-optics.

materials science, multidisciplinary,physics, applied, coatings & films
Integrated fabrication of micro/nano-fluidic chip based on nano-imprint lithography and bonding

Ran Zhang,Da Huang,Yuanyi Fan,Xiao Liu,Ze Liu,Jinkui Chu

DOI: https://doi.org/10.1088/1361-6439/ac0ff7

2021-07-13

Journal of Micromechanics and Microengineering

Abstract:In order to achieve high-efficiency and high-precision fabrication of nanochannels in micro/nano-fluidic devices, a new method for integrating nano-imprint lithography manufacturing nano-channels and polydimethylsiloxane (PDMS) microchannels with silicon nitride as a bonding layer is proposed. Nanoimprint technology has the advantages of high-precision replication of the template nano-groove size and the ability to form a large number of channels at one time. By depositing silicon nitride on the surface of the nano-trench to improve its bonding force with PDMS treated with oxygen plasma, the bonding strength can withstand pressures above 0.3 MPa. The accuracy of making nanochannels with a characteristic size of 100 nm in this solution can reach more than 95%. Fluorescence experiments using this device show that the device has better enrichment capacity, and its mechanism can be explained by the size exclusion enrichment effect.

engineering, electrical & electronic,nanoscience & nanotechnology,instruments & instrumentation,physics, applied
Fabrication of Metallic Patterns on Highly Curved Substrates Via Nanoimprint Lithography in Association with an Etch-in Process

Xin Hu,Hongquan Wang,Chun Zhai,Haixiong Ge,Yushuang Cui

DOI: https://doi.org/10.1039/c6tc03392j

IF: 6.4

2016-01-01

Journal of Materials Chemistry C

Abstract:Cr and Au gratings are fabricated on both planar and highly curved substrates via nanoimprint lithography in association with an etch-in process. Furthermore, a 330 nm deep surface relief fiber Bragg grating is fabricated via RIE using the Cr mask on an optical fiber.
Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Yang Ou,Liang-Wei Zhu,Wen-Da Xiao,Hao-Cheng Yang,Qing-Jun Jiang,Xia Li,Jian-Guo Lu,Ling-Shu Wan,Zhi-Kang Xu

DOI: https://doi.org/10.1021/jp410037q

2014-01-01

The Journal of Physical Chemistry C

Abstract:Micropatterning techniques independent of high-cost facilities are highly appreciated in bioanalysis and optoelectronics. Here we report a novel nonlithographic method based on self-assembled honeycomb films with through pores for micropatterning of zinc oxide nanowires (ZnO NWs). The ordered films were prepared via the breath figure method and used as templates for the solution growth of ZnO NWs. The resultant ZnO NW micropatterns were characterized by scanning electron microscopy, energy dispersive X-ray spectrometry, X-ray diffraction, high-resolution transmission electron microscopy, and photoluminescence spectrometry. Room-temperature photoluminescence spectra indicate that the micropatterned ZnO NWs show greatly enhanced near-band-edge emission and have potential as high-efficiency blue or near-UV light emitters. This facile and versatile approach is further demonstrated by templating biomimetic hydroxyapatite and silver nanoparticles on polydopamine-coated substrates. This work provides an alternative route to fabricating micropatterned functional surfaces at low cost and high efficiency.
Biomimetic sapphire windows enabled by inside-out femtosecond laser deep-scribing

Xue-Qing Liu,Yong-Lai Zhang,Qian-Kun Li,Jia-Xin Zheng,Yi-Ming Lu,Saulius Juodkazis,Qi-Dai Chen,Hong-Bo Sun

DOI: https://doi.org/10.1186/s43074-022-00047-3

IF: 16.5

2022-01-21

PhotoniX

Abstract:Abstract Femtosecond laser machining of biomimetic micro/nanostructures with high aspect ratio (larger than 10) on ultrahard materials, such as sapphire, is a challenging task, because the uncontrollable surface damage usually results in poor surface structures, especially for deep scribing. Here, we report an inside-out femtosecond laser deep scribing technology in combination with etching process for fabricating bio-inspired micro/nanostructures with high-aspect-ratio on sapphire. To effectively avoid the uncontrollable damage at the solid/air interface, a sacrificial layer of silicon oxide was employed for surface protection. High-quality microstructures with an aspect ratio as high as 80:1 have been fabricated on sapphire surface. As a proof-of-concept application, we produced a moth-eye inspired antireflective window with sub-wavelength pyramid arrays on sapphire surface, by which broadband (3–5 μm) and high transmittance (98% at 4 μm, the best results reported so far) have been achieved. The sacrificial layer assisted inside-out femtosecond laser deep scribing technology is effective and universal, holding great promise for producing micro/nanostructured optical devices.

optics
Fabrication of Patterned Concave Microstructures by Inkjet Imprinting

Bin Bao,Jieke Jiang,Fengyu Li,Pengchao Zhang,Shuoran Chen,Qiang Yang,Shutao Wang,Bin Su,Lei Jiang,Yanlin Song

DOI: https://doi.org/10.1002/adfm.201500908

IF: 19

2015-01-01

Advanced Functional Materials

Abstract:Concave microstructures such as microwells and microgrooves are widely utilized in fields such as biochips, microfluidics, and functional devices. Previously, concave microstructure fabrication was mostly based on laser etching or lithography which is either costly or of multisteps. The inkjet etching method is a direct structuring technique, but limited by its inherent transverse ink diffusion that leads to low feature resolution. Nanoimprint lithography can reach submicro and even nano ranges, whereas an elaborate template is needed. Thus, it is still a challenge to realize controllable fabrication of concave microstructures in large areas with high efficiency and resolution. Here, a template‐free strategy to fabricate concave microstructures with high resolution by inkjet imprinting is provided. In this method, a sacrificial ink is inkjet‐printed onto a precured viscoelastic surface and imprints its shapes to construct concave microstructures. The morphology of the microstructures could be adjusted by controlling the interaction between the two immiscible phases. The microwells/microgrooves could be used to pattern single cells and functional materials such as optical, electronic, and magnetic nanoparticles. These results will open a new pathway to fabricate concave microstructures and broaden their applications in various functional devices.
Fabrication of surface-patterned ZnO thin films using sol-gel methods and nanoimprint lithography

Shuxi Dai,Yang Wang,Dianbo Zhang,Xiao Han,Qing Shi,Shujie Wang,Zuliang Du

DOI: https://doi.org/10.48550/arXiv.1108.3894

2011-08-19

Materials Science

Abstract:Surface-patterned ZnO thin films were fabricated by direct imprinting on ZnO sol and subsequent annealing process. The polymer-based ZnO sols were deposited on various substrates for the nanoimprint lithography and converted to surface-patterned ZnO gel films during the thermal curing nanoimprint process. Finally, crystalline ZnO films were obtained by subsequent annealing of the patterned ZnO gel films. The optical characterization indicates that the surface patterning of ZnO thin films can lead to an enhanced transmittance. Large-scale ZnO thin films with different patterns can be fabricated by various easy-made ordered templates using this combination of sol-gel and nanoimprint lithography techniques.
Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Ran Guo,Liping Qi,Liang Xu,Helin Zou

DOI: https://doi.org/10.1016/j.jmapro.2022.01.034

IF: 5.684

2022-03-01

Journal of Manufacturing Processes

Abstract:Nanoimprint is a low-cost and high-precision nano-pattern replication technology. In the nanoimprint manufacturing process, the quality of nano-mold directly determines the quality of nano-pattern. In this paper, we proposed a method for manufacturing silicon nano-mold using inverted trapezoidal photoresist (AZ5214E). During the manufacturing process, a nanogap was formed due to the size difference between the top and bottom surfaces of inverted trapezoidal photoresist when the Cu vertical deposition process was completed. Then the nanogap pattern was transferred to the silicon substrate by deep reactive ion etching (DRIE) to create nanochannels, and sub-50 nm silicon nano-molds were obtained. The influence of UV exposure parameters on photoresist sidewall angle was studied. The effect of photoresist sidewall angle on the width of nanogaps was analyzed, which ultimately affects the size of nanochannel. We believe that the proposed method can play a certain role in promoting the development of nanotechnology and nanoscience.

engineering, manufacturing
High-quality AlN Epitaxy on Nano-Patterned Sapphire Substrates Prepared by Nano-Imprint Lithography

Lisheng Zhang,Fujun Xu,Jiaming Wang,Chenguang He,Weiwei Guo,Mingxing Wang,Bowen Sheng,Lin Lu,Zhixin Qin,Xinqiang Wang,Bo Shen

DOI: https://doi.org/10.1038/srep35934

IF: 4.6

2016-01-01

Scientific Reports

Abstract:We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum values for (0002) and (10 2) reflections are 171 and 205 arcsec, respectively. The optimized NPSS contribute to eliminating almost entirely the threading dislocations (TDs) originating from the AlN/sapphire interface via bending the dislocations by image force from the void sidewalls before coalescence. In addition, reducing the misorientations of the adjacent regions during coalescence adopting the low lateral growth rate is also essential for decreasing TDs in the upper AlN epilayer.

Fabrication of Nano-Patterned Sapphire Substrates by Combining Nanoimprint Lithography with Edge Effects

Fabrication of Volcano-Shaped Nano-Patterned Sapphire Substrates Using Colloidal Self-Assembly and Wet Chemical Etching

Study on the Morphology and Shape Control of Volcano-Shaped Patterned Sapphire Substrates Fabricated by Imprinting and Wet Etching

Large-scale Fabrication of Nanopatterned Sapphire Substrates by Annealing of Patterned Al Thin Films by Soft UV-nanoimprint Lithography

Fabrication of Wafer-Scale Nanopatterned Sapphire Substrate by Hybrid Nanoimprint Lithography

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

Fabrication of Wafer-Scale Nanopatterned Sapphire Substrate Through Phase Separation Lithography

Fabrication of the Patterned Sapphire Substrate by the Imprint Lithography with the Flexible Hybrid Mold

Nano-Patterns Fabricated by Soft Press and Temperature-Pressure Variation Imprint

Fabrication of 2D silicon nano-mold by side etch lift-off method

Effect of exposure parameters and annealing on the structure and morphological properties of nanopatterned sapphire substrates prepared by solid state reaction

Unconventional Lithography for Patterned Nanomaterials

A Method for Preparing Surface Sub-Microstructures on Sapphire Surfaces Using Femtosecond Laser Processing Technology

Integrated fabrication of micro/nano-fluidic chip based on nano-imprint lithography and bonding

Fabrication of Metallic Patterns on Highly Curved Substrates Via Nanoimprint Lithography in Association with an Etch-in Process

Nonlithographic Fabrication of Nanostructured Micropatterns Via Breath Figures and Solution Growth

Biomimetic sapphire windows enabled by inside-out femtosecond laser deep-scribing

Fabrication of Patterned Concave Microstructures by Inkjet Imprinting

Fabrication of surface-patterned ZnO thin films using sol-gel methods and nanoimprint lithography

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

High-quality AlN Epitaxy on Nano-Patterned Sapphire Substrates Prepared by Nano-Imprint Lithography