Void formation and failure in InGaN/AlGaN double heterostructures

Y.G. Wang,W. Li,P.D. Han,Z. Zhang
DOI: https://doi.org/10.1016/S0022-0248(03)01119-9
IF: 1.8
2003-01-01
Journal of Crystal Growth
Abstract:Condensed clusters of point defects within an InGaN/AlGaN double heterostructure grown by metal-organic vapor phase epitaxy on sapphire substrate have been observed using transmission electron microscopy. The existence of voids results in failure of the heterostructure in electroluminescence. The voids are 50–100nm in diameter and are distributed inhomogeneously within In0.25Ga0.75N/AlGaN active layers. The density of the voids was measured as 1015cm−3, which corresponds to a density of dangling bonds of 1020cm−3. These dangling bonds may fully deplete free carriers in this double heterostructure and result in the heterostructure having high resistivity as confirmed by electrical measurement.
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