The Effect of Electron Radiation Damage on Transport Properties of A-Si:H

KJ CHEN,GH WANG
DOI: https://doi.org/10.1016/0022-3093(85)90704-5
IF: 4.458
1985-01-01
Journal of Non-Crystalline Solids
Abstract:A 20 MeV electron linear accelerator designed by Nanjing University with irradiation dose 32 Mrad and different energies 8 MeV, 12 MeV, 16 MeV have been used to radiate the sample. The a-Si:H films were prepared by r.f. glow discharge decomposition of silane doped with phosphine at substrate temperature 250°C. The defects created by electron-irradiation have been investigated by lifetime spectrum of positron annihilation. The conductive activation energy Ea, id est Fermi level of n-a-Si:H films was changed from 0.35 eV to 0.85 eV after irradiation. Meanwhile, the magnitude of electron drift mobility of n-a-Si:H films didn't find change at room temperature by traveling wave technique. These results can compare with that of light induced metastable effects in n-a-Si:H films.
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