430-V 12.4- $hboxmomegacdot Hboxcm^2$ Normally off 4H-Sic Lateral JFET

Ming Su,Kuang Sheng,Yuzhu Li,Yongxi Zhang,Ran Wu,Jian H. Zhao,Jianhui Zhang,Larry X. Li
DOI: https://doi.org/10.1109/led.2006.883057
IF: 4.8157
2006-01-01
IEEE Electron Device Letters
Abstract:This letter reports the experimental demonstration of the first 4H-SiC normally OFF high-voltage lateral junction field-effect transistor. The design and fabrication of such a device have been investigated. The fabricated device has a vertical channel length of 1.8 mu m created by tilted aluminum implantation on the sidewalls of deep trenches and a lateral drift-region length of 5 mu m. Normally OFF operation (V-GS = 0 V) with a blocking voltage V-br of 430 V has been achieved with a specific ON-resistance Ron-sp of 12.4 m Omega (.) cm(2), which is the lowest specific ON-resistance for 4H-SiC lateral power switches reported to date, resulting in a V-br(2)/Ron-sp value of 15 MW/cm(2). This is among the best V-br(2)/Ron-sp figure-of-merit reported to date for 4H-SiC lateral high-voltage devices.
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