An Improved Technology for Fabrication of Integrated Pb(Zr,Ti)O-3 Ferroelectric Capacitor

WN Huang,YY Lin,TG Tang
DOI: https://doi.org/10.1080/00150190108008757
2001-01-01
Ferroelectrics
Abstract:This paper presents an improved technology for fabricating the integrated ferroelectric thin film capacitor. Using this technology the contact between PZT ferroelectric thin film and the top platinum electrode was greatly improved without changing any PZT structure, and integrated PZT thin film capacitor with high quality was successfully obtained.
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