Antiferroelectric titanium-doped zirconia thin films deposited via HiPIMS for highly efficient electrocaloric applications

Yu-Hua Liu,Po-Chun Wang,Li-Hsiang Lin,Jer-Chyi Wang
DOI: https://doi.org/10.1016/j.jeurceramsoc.2020.12.041
IF: 5.7
2021-06-01
Journal of the European Ceramic Society
Abstract:In this study, the antiferroelectric (AFE) and electrocaloric (EC) characteristics of lead-free titanium (Ti)-doped zirconia (ZrO2) thin films deposited via high-power impulse magnetron sputtering (HiPIMS) were investigated. The argon-to-oxygen ratio was initially optimized during deposition to obtain a more stoichiometric ZrO2 film for enhanced antiferroelectricity. Furthermore, enhanced crystallinity was achieved through the incorporation of Ti atoms into ZrO2 thin films as confirmed via grazing incidence X-ray diffraction and high-resolution transmission electron microscopy. For metal-insulator-metal capacitors with Ti-doped ZrO2 thin films, the AFE behaviors were significantly improved because of the excellent crystallinity of the tetragonal phase. Based on a fast polarization response and robust fatigue resistance under a 106-cycle endurance test, the EC effect was successfully explored, and an adiabatic temperature change (ΔT) of −14.8 K was realized. With competitive EC properties, Ti-doped ZrO2 thin films deposited via HiPIMS are proposed as promising candidates for use in future cooling systems.
materials science, ceramics
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