Abstract:Nanostructures with sufficiently large areas are necessary for the development of practical devices. Current efforts to fabricate large-area nanostructures using step-and-repeat nanoimprint lithography, however, result in either wide seams or low efficiency due to ultraviolet light leakage and the overflow of imprint resin. In this study, we propose an efficient method for large-area nanostructure fabrication using step-and-repeat nanoimprint lithography with a composite mold. The composite mold consists of a quartz support layer, a soft polydimethylsiloxane buffer layer, and multiple intermediate polymer stamps arranged in a cross pattern. The distance between the adjacent stamp pattern areas is equal to the width of the pattern area. This design combines the high imprinting precision of hard molds with the uniform large-area imprinting offered by soft molds. In this experiment, we utilized a composite mold consisting of three sub-molds combined with a cross-nanoimprint strategy to create large-area nanostructures measuring 5 mm × 30 mm on a silicon substrate, with the minimum linewidth of the structure being 100 nm. Compared with traditional step-and-flash nanoimprint lithography, the present method enhances manufacturing efficiency and generates large-area patterns with seam errors only at the micron level. This research could help advance micro-nano optics, flexible electronics, optical communication, and biomedicine studies.

Fabrication of split-ring resonators by tilted nanoimprint lithography.

Fabrication and Characterization of Large Area Metallic Nano-Split-Ring Arrays by Nanoimprint Lithography

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Wafer-Scale Fabrication of Metal Nanoring and Nanocrescent Arrays from Nanoimprinted Nanopillar Arrays

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

High Depth-of-Field Nanostructures by Rotational Near-Field Photolithography

Flexible Devices Fabricated by a Plate-to-roll Nanoimprint Lithography System

Direct Metal Nano-Patterning on Irregular Substrate Surfaces by Reversal Imprint Lithography

Fabrication of Periodic Metal Nanowires with Microscale Mold by Nanoimprint Lithography.

Versatile Nanoring Fabrication Assisted by Hole-mask Colloidal Lithography

Fabrication of Metallic Split-Ring Arrays for Metamaterials Using Silica Particle Templates Anchored on A Silicon Substrate

Development of Novel SU-8 Based Nanoimprint Lithography

Nanoimprint Lithography for the Fabrication of Interdigitated Cantilever Arrays

Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

Nanoimprint lithography technology

Fabrication of Metal Suspending Nanostructures by Nanoimprint Lithography (NIL) and Isotropic Reactive Ion Etching (RIE)

Application of Lift-Off Process in Fabricating Nanoimprint Stamp

Hybrid nanoimprint-soft lithography with sub-15 nm resolution.

Fabrication of sub-50 nm nanochannel array by an angle forming lift-off method

Double transfer UV-curing nanoimprint lithography.

Fabrication And Applications Of Ordered Au Nanodisk And Nanohole Arrays