Enhanced Depth of Lift-off Pattern Defined with Soft Mold Ultraviolet Nanoimprint by Multi-Layer Masks

王智浩,刘文,左强,王磊,赵彦立,徐智谋,Wang Zhi-Hao,Liu Wen,Zuo Qiang,Wang Lei,Zhao Yan-Li,Xu Zhi-Mou
DOI: https://doi.org/10.1088/0256-307X/31/8/088102
2014-01-01
Chinese Physics Letters
Abstract:The traditional lift-off process can hardly be carried out in ultraviolet nanoimprint defined patterns due to the poor solubility of the ultraviolet resist. Moreover, the depth of lift-off pattern defined by an ultraviolet nanoimprint is limited by that of the soft mold. In this work, a modified nanoimprint process by a multi-layer mask method is introduced to enhance the depth of the final lift-off pattern. Pillar photonic crystal is fabricated from the hole pattern defined by NIL to prove the pattern-reversal capability. On its basis, combining the features of overetching technology and the lateral diffusion phenomenon in the metal depositing process, pillar-shaped photonic crystal stamps with different duty cycles have been fabricated by adjusting the etching time of the lift-off layer. Based on this process, a 50-nm line width metal grating is fabricated from a soft stamp with an aspect ratio as low as 1.
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