Abstract:Nanoimprint lithography (NIL) is a fast, simple and high throughput technique that allows fabrication of structures with nanometre precision features at low cost. We present an advanced bilayer nanoimprint lithography approach to fabricate four terminal nanojunction devices for use in single molecule electronic studies. In the first part of this work, we demonstrate a NIL lift-off process using a bilayer resist technique that negates problems associated with metal side-wall tearing during lift-off. In addition to precise nanoscale feature replication, we show that it is possible to imprint micron- sized features while still maintaining a bilayer structure enabling an undercut resist structure to be formed. This is accomplished by choosing suitable imprint parameters as well as residual layer etching depth and development time. We then use a feedback controlled electromigration procedure, to produce room-temperature stable nanogap electrodes with sizes below 2 nm. This approach facilitates the integration of molecules in stable, solid-state molecular electronic devices as demonstrated by incorporating benzenethiol as molecular bridges between the electrodes and characterizing its electronics properties through current-voltage measurements. The observation of molecular transport signatures, showing current suppression in the I-V behaviour at low voltage, which is then lifted at high voltage, signifying on- and off-resonant transport through molecular levels as a function of voltage, is confirmed in repeated I-V sweeps. The large conductance, symmetry of the I-V sweep and small value of the voltage minimum in Transition Voltage Spectroscopy indicates the bridging of the two benzenethiol molecules is by π-stacking.

Nanoimprint Lithography for the Fabrication of Interdigitated Cantilever Arrays

Electrostatic layer-by-layer nano-assembly: films, cantilevers, micropatterns, and nanocapsules

Plasmon-driven Nanowire Actuators for On-Chip Manipulation

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures.

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Fabrication of Carbon Nanotubes on Interdigitated Metal Electrode for Switchable Nanophotonic Devices

Fabrication of Nano-Electromechanical Structures Down to 20 nm by Spacer Technology

Electron-beam lithography of nanostructures at the tips of scanning probe cantilevers

High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch

Two-step MEMS microfabrication via 3D direct laser lithography

Precise tailoring of multiple nanostructures based on atomic layer assembly via versatile soft-templates

Unconventional Lithography for Patterned Nanomaterials

CMOS-Compatible Electrochemical Nanoimprint:High Throughput Fabrication of Ordered Microstructures on Semiconductor Wafer by Using a Glassy Carbon Mold

Nanoscale junctions for single molecule electronics fabricated using bilayer nanoimprint lithography combined with feedback controlled electromigration

Grayscale Electron Beam Lithography Direct Patterned Antimony Sulfide

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification

Development of Novel SU-8 Based Nanoimprint Lithography

Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array

Atomic Calligraphy: The Direct Writing of Nanoscale Structures using MEMS

Direct Imprint Patterning of 2-D and 3-D Nanoparticle/polymer Hybrid and Crystalline Metal Oxide Structures for Printed Optical, Electronic, and Energy Devices

Hard-Tip, Soft-Spring Lithography