Abstract:Uniform and conformal deposition of tin oxide thin films is important for several applications in electronics, gas sensing, and transparent conducting electrodes. Thermal atomic layer deposition (ALD) is often best suited for these applications, but its implementation requires a mechanistic understanding of the initial nucleation and subsequent ALD processes. To this end, in situ FTIR and ex situ XPS have been used to explore the ALD of tin oxide films using tributyltin ethoxide and ozone on an OH-terminated, SiO2-passivated Si(111) substrate. Direct chemisorption of tributyltin ethoxide on surface OH groups and clear evidence that subsequent ligand exchange are obtained, providing mechanistic insight. Upon ozone pulse, the butyl groups react with ozone, forming surface carbonate and formate. The subsequent tributyltin ethoxide pulse removes the carbonate and formate features with the appearance of the bands for CH stretching and bending modes of the precursor butyl ligands. This ligand-exchange behavior is repeated for subsequent cycles, as is characteristic of ALD processes, and is clearly observed for deposition temperatures of 200 and 300 °C. On the basis of the in situ vibrational data, a reaction mechanism for the ALD process of tributyltin ethoxide and ozone is presented, whereby ligands are fully eliminated. Complementary ex situ XPS depth profiles confirm that the bulk of the films is carbon-free, that is, formate and carbonate are not incorporated into the film during the deposition process, and that good-quality SnOx films are produced. Furthermore, the process was scaled up in a cross-flow reactor at 225 °C, which allowed the determination of the growth rate (0.62 Å/cycle) and confirmed a self-limiting ALD growth at 225 and 268 °C. An analysis of the temperature-dependence data reveals that growth rate increases linearly between 200 and 300 °C.

Nano-particle thin films of tin oxides

P-type Tin–indium Oxide Films Prepared by Thermal Oxidation of Metallic InSn Alloy Films

Electrodeposition of Sno2 Thin Films from Aqueous Tin Sulfate Solutions

Nanosized tin oxide sensitive layer prepared by reactive direct current magnetron sputtering of tin

Deposition of Dense SiO2 Thin Films for Electrical Insulation Applications by Microwave ECR Plasma Source Enhanced RF Reactive Magnetron Sputtering

Microstructure Formation and Characterization of Nano-Tin Oxide Thin Films Prepared Using Different Concentration

Properties of Nanosized Tin Oxide Thin Film Prepared by Reactive Magnetron Sputtering

Preparation of Tin-Based Oxides Thin Films and Its' Electrochemical Properties

Synthesis of Tin Oxide Nanoparticles by Precipitation Process: Effects of pH and Temperature on the Particle Size and Morphology

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Microstructural and Functional Stability of Large-Scale SnO2:F Thin Film with Micro-Nano Structure

Hydrothermal Preparation and Characterization of Nanocrystalline Porous Tin Dioxide Thin Films

A study on phase transformation of SnOx thin films prepared by reactive magnetron sputtering

Preparation of Nano-Structured BaTiO3 Thin Film by Electrophoretic Deposition and Its Characterization

The Effect of Calcination Temperature on Nanosized Tin Oxide Thin Film

Effect of Oxygen Vacancy on the Crystallinity and Optical Band Gap in Tin Oxide Thin Film

Synthesis of Nanostructured Tin Oxide by Sol–Gel and Sonochemical Approaches in an Ionic Liquid

Investigation of structural and photoluminescence properties of nanocrystalline tin oxide thin films grown by ultrasonic spray pyrolysis method

Structural, Morphological and Optical Characterization of Tin Doped Zinc Oxide Thin Film by (SPT)

Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone

Examining the Effect of Thermal Treatment on the Surface Morphology and Structural Properties of Tin Dioxide Thin Films Grown Using an Economical Spray Deposition Method