Properties of Nanosized Tin Oxide Thin Film Prepared by Reactive Magnetron Sputtering

Xiao Di Liu,Dacheng Zhang
DOI: https://doi.org/10.1115/mnc2007-21333
2007-01-01
Abstract:Nanosized tin oxide thin films were fabricated on silicon and quartz glass substrates by direct current reactive magnetron sputtering method, and then were calcined at different temperatures ranging from 400°C to 900°C. The results analyzed by X ray photoemission spectra (XPS), scanning electron microscope (SEM), Spectroscopic ellipsometer, Powder X-ray diffraction (XRD), and HP4145B semiconductor parameter analyzer measurements show that the sample with quartz glass substrate and calcinated at 650°C possesses better properties and suitable to be used in our gas sensor.
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