Sintering of Nanopowders of Amorphous Silicon Nitride under Ultrahigh Pressure

Li Ya-Li,Liang Yong,Zheng Fen,Ma Xian-Feng,Cui Suo-Jing
DOI: https://doi.org/10.1557/jmr.2000.0141
2000-01-01
Abstract:Nanopowders of amorphous silicon nitride were densified and sintered without additives under ultrahigh pressure (1.0–5.0 GPa) between room temperature and 1600 °C. The powders had a mean diameter of 18 nm and contained ∼5.0 wt% oxygen that came from air-exposure oxidation. Sintering results at different temperatures were characterized in terms of sintering density, hardness, phase structure, and grain size. It was observed that the nanopowders can be pressed to a high density (87%) even at room temperature under the high pressure. Bulk Si 3 N 4 amorphous and crystalline ceramics (relative density: 95–98%) were obtained at temperatures slightly below the onset of crystallization (1000–1100 °C) and above 1420 °C, respectively. Rapid grain growth occurred during the crystallization leading to a grain size (>160 nm) almost 1 order of magnitude greater than the starting particulate diameters. With the rise of sintering temperature, a final density was reached between 1350 and 1420 °C, which seemed to be independent of the pressure applied (1.0–5.0 GPa). The densification temperature observed under the high pressure is lower by 580 °C than that by hot isostatic pressing sintering, suggesting a significantly enhanced low-temperature sintering of the nanopowders under a high external pressure.
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