Abstract:In this study, ion implantation was used as a surface modification method for active and inactive brazing of alumina ceramics to metals. Alumina was implanted with Ti ions at acceleration voltages of 35kV and 55kV at doses ranging between 2×1017 and 1×1018ions/cm2, with Ni ions at an acceleration voltage of 55kV at doses ranging between 2×1016 and 6×1017ions/cm2, and with Al ions at 55kV with a dose of 2×1017ions/cm2. After implantation, the brazing of alumina to Nb was performed using the active brazing metal Ag70Cu27Ti3 (wt.%) at 850°C/870°C and the inactive brazing metal Ag72Cu28 (wt.%) at 830°C in a vacuum respectively. The surface properties of implanted alumina, e.g., implanted ions depth and concentration distribution, newly formed phases, sheet resistance etc., were studied by Rutherford backscattering (RBS), Glancing X-ray diffraction (GXRD) and four-probe method. Shear strengths of the active and inactive brazing joints were measured. Microstructures of the joints were analyzed by scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). There is no obvious evidence that Ti and Ni ion implantation can enhance the quality of active brazing joints. However, it has been found that Al ion implantation can significantly increase the shear strengths of active brazing joints to average value 139MPa, which is 30% greater than in non-ion implantation (107MPa). It has also been found that ion implantation can improve the shear strengths of alumina–Nb inactive brazing joints. Maximum average shear strength of the inactive brazing joints can reach 43MPa when Ni ions were used at an acceleration voltage of 55kV in a dose of 2×1017ions/cm2. Finally, the effects of ion implantation on alumina–Nb active and inactive brazing were discussed.

Change of Sheet Resistance of High Purity Alumina Ceramics Implanted by Cu and Ti Ions

Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion

Study on the Properties of Alumina Ceramics after Implanted by Titanium Ions with MEVVA Sources

Effects of ion implantation on the brazing properties of high purity alumina

Long-term electrical conductivity of titanium-implanted alumina

Study on comparision of the mechanical properties of ceramics after ion implantation

Bending Strength of Ceramics Implanted by Titanium, Zirconium and Chromium Ions with MEVVA Source

Structure and Properties of Molybdenum Implanted with High-Flux Carbon Ion

Improved Mechanical Properties of Al2O3/PTFE Layer by Metal Ion Implantation

High Current Ni- and Fe-ion Implantation into an Al Surface to Modify the Mechanical Properties

Hardness and Tribological Properties of Silicon Nitride Ceramics Implanted by Titanium Ions with MEVVA Sources

Behaviour Of Mevva Metal Ion Implantation For Surface Modification Of Materials

Effects of Cu Ion Implantation on the Microstructure, Dielectric and Impedance Properties of SrTiO3 Ceramics Prepared by Reduction-Reoxidation Method

Modification of surface mechanical properties of aluminum by high current Mo ion implantation using a MEVVA ion source

Mechanical Properties and Microstructures of Sintered Zirconia Ceramics Implanted by Titanium Ions with MEVVA Sources

Flexural Strength Change of Silicon Nitride Implanted by High Dose Titanium Ions

Metal vapor vacuum-arc ion implantation effects on the adhesion and hardness of ion-beam deposited Cr/Cu films

Experimental and Numerical Evaluations of Adhesion Strength and Stress in Tin Films Deposited on Ti-Implanted Aluminum

Surfaces Modification Of Ceramic Cutting Tools By Mevva Ion Implantation

Surface Hardening of Al by High Current Fe-Ion Implantation

Modification of Oxidation Resistance of Copper Films by Shallow Implantation