Spectroscopic Study on Pulsed Laser Ablation of Graphite Target in Ecr Nitrogen Plasma for Carbon Nitride Film Deposition
X. K. Shen,J. Sun,N. Xu,Z. F. Ying,L. Q. Shi,A. M. Wu,Z. S. Gong,J. D. Wu
DOI: https://doi.org/10.1016/j.diamond.2005.10.015
IF: 3.806
2006-01-01
Diamond and Related Materials
Abstract:The influence of nitrogen plasma generated by electron cyclotron resonance (ECR) microwave discharge on deposition of carbon nitride films by means of ECR plasma assisted reactive pulsed laser deposition was investigated by a comparative study on the optical emission of the plume produced by pulsed laser ablation of a graphite target in ECR nitrogen plasma, in vacuum and in low-pressure nitrogen gas ambient. Spatial and temporal spectroscopic measurements show that in vacuum optical emission lines originating from carbon atoms and ions dominate the plume emission, while in low-pressure N2 ambient weak CN emissions appear. In nitrogen plasma, the plume emission exhibits itself very differently. It evolves from consisting of emissions almost from mono-atomic carbon atoms and ions to being dominated by emissions from CN molecules. The presence of the reactive nitrogen plasma greatly enhanced the CN emissions and eliminated the emission lines from carbon atoms and ions. The appearance of the CN emissions occurs after the emissions from carbon atoms and ions have decayed considerably, indicating that the dominant mechanism for the formation of CN molecules is gaseous phase reaction. Carbon nitride films with nitrogen content of about 40 at.% were obtained. Possible processes for CN molecule formation in gaseous phase and mechanisms responsible for efficient nitrogen incorporation and carbon nitride film deposition were suggested.