Abstract:A series of carbon nitride (CNx) films were deposited on Si substrates by ion beam-assisted deposition. The CNx films were deposited by ion sputtering of graphite with N ions and they were additionally bombarded by N ions with low energy during deposition. The films were characterized with atomic force microscope, X-ray photoelectron spectroscopy, Raman spectrum and transmission electron microscope. The results indicated that the characteristics of the CNx films are strongly dependent on the bombarding energy. The hardness, elastic modulus and residual stress of the films were systemically investigated. Comparing with non-bombarding CNx film, the CNx films with bombardment of N ions have higher [N]/[C] ratio and sp3/sp2 ratio. Bombardment of N ions with low bombarding energy could increase sp3/sp2 ratio and improve mechanical properties of CNx films, while further increasing bombarding energy has no evident effect on films' properties. The residual stress of the films exhibited similar trend as hardness with the variation of bombarding energy of N ions.

Studies of CN1 Films Deposited by Ion-Beam-Assisted Laser Ablation of Graphite

Studies of Cn<sub>1</sub> Films Deposited by Ion-Beam-Assisted Laser Ablation of Graphite

Studies Of Cnx Films Deposited By Ion-Beam-Assisted Laser Ablation Of Graphite

Cn(X) Films Deposited By Laser-Ablation Of Graphite Under Low-Energy Nitrogen-Ion Beam Bombardment

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Ion-beam-assisted Deposition of CNx Films

Optical & Electronic Properties of Carbon Nitride Thin Films

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

STRUCTURAL CHARACTERIZATION OF THE CN FILMS

Characterization and modification of carbon nitride films deposited by laser ablation under low energy ion‐beam bombardment

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Electron energy loss spectroscopy of amorphous carbon nitride

Probing Carbon Nanoparticles in Cnx Thin Films Using Raman Spectroscopy

Investigation of carbon nitride films by cathodic arc evaporation

Amorphous CNx films prepared by electrochemical deposition

Investigation of Carbon Nitride Films Deposited by Ion Beam-Assisted Deposition with Low Bombarding Energy of N Ions

Deposition of Nanocrystalline Cnx Thin Films on Co/Ni-Covered Substrate by Nitrogen-Atom-Beam-Assisted Pulsed Laser Ablation

Raman Spectra Of Nanocrystalline Carbon Nitride Synthesized On Cobalt-Covered Substrate By Nitrogen-Atom-Beam-Assisted Pulsed Laser Ablation

Preparation and Characterisation of Carbon Nitride Films Deposited by Pulsed Laser Arc Deposition

Growth of CN Films by Reactive Ionized Cluster Beam Deposition

Growth of Ni/Co-catalyzed crystalline CNx thin films by nitrogen-plasma-assisted pulsed laser deposition