Abstract:Thermal decomposition behavior of carbon nitride films prepared via nitrogen ion implantation into graphite in a special mass-separated low-energy ion beam system was investigated using in situ X-ray photoelectron spectrometry (XPS), residual gas analysis and secondary ion mass spectrometry. The XPS N1s line of the CNx films could be deconvoluted into three components, which are denoted as N(I), N(II) and N(III) states with binding energies of ∼398, 400 and 402 eV, respectively. A dramatic evolution of the N1s line during annealing of a room-temperature-implanted CNx film was revealed. Upon heating, the two main components N(I) and N(II) split, and the N(I) and N(III) components attenuated rapidly with increase in temperature until they vanished at 1000 °C, leaving only the N(II) component. The N(II) component exhibited no significant change during heating up to 800 °C but decreased upon further heating to a higher temperature. These results indicate that the N(II) state is more thermally stable than the N(I) state. The assignment of the bonding states between carbon and nitrogen atoms is discussed according to these results and the literature. The desorbed species upon heating of CNx films were monitored using a quadrupole mass spectrometer. The results showed that heating of CNx films led to desorption of N2 and C2N2 molecules. Above 1000 °C, highly significant emission of CN− ions was observed as a result of dissociative negative ionization of desorbing C2N2 molecules.

Studies Of Cnx Films Deposited By Ion-Beam-Assisted Laser Ablation Of Graphite

Studies of Cn<sub>1</sub> Films Deposited by Ion-Beam-Assisted Laser Ablation of Graphite

Studies of CN1 Films Deposited by Ion-Beam-Assisted Laser Ablation of Graphite

Cn(X) Films Deposited By Laser-Ablation Of Graphite Under Low-Energy Nitrogen-Ion Beam Bombardment

Ion-beam-assisted Deposition of CNx Films

Deposition of Nanocrystalline Cnx Thin Films on Co/Ni-Covered Substrate by Nitrogen-Atom-Beam-Assisted Pulsed Laser Ablation

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge

Probing Carbon Nanoparticles in Cnx Thin Films Using Raman Spectroscopy

Electron energy loss spectroscopy of amorphous carbon nitride

C3N4 Film Deposited by Synchrotron Radiation Assisted CVD

Characterization and modification of carbon nitride films deposited by laser ablation under low energy ion‐beam bombardment

Investigation of carbon nitride films by cathodic arc evaporation

Optical & Electronic Properties of Carbon Nitride Thin Films

STRUCTURAL CHARACTERIZATION OF THE CN FILMS

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Growth of Ni/Co-catalyzed crystalline CNx thin films by nitrogen-plasma-assisted pulsed laser deposition

Experimental Studies of Superhard Materials Carbon Nitride Cnx Prepared by Ion-Beam Synthesis Method

Preparation of graphitic carbon nitride by electrodeposition

Synthesis and Characterization of C3N4 Hard Films

Synthesis and Thermal Decomposition of Carbon Nitride Films Prepared by Nitrogen Ion Implantation into Graphite