Abstract:y Using TaCl5 as the precursor, two types of Ta2O5 sols were synthesized with employment of different dual additives, namely, diethanolamine (DEA) with acetylacetone and DEA with polyethylene glycol (PEG). The prepared sol-gel Ta2O5 films were featured by the low surface roughness, high transmittance, low absorption and high laser-induced damage threshold (LIDT). The highest LIDT of 29.1 J/cm(2) was obtained in the film prepared with the DEA and PEG additives. This should be attributed to the chelation effect of DEA and the steric hindrance imposed by PEG, which synergistically resulted in a more regular three-dimensional network structure and consequently lower film internal defects. In the case of temperature increase to 150 degrees C, the LIDT levels of both the films decreased. The damage morphologies indicated the defect-induced mechanism for the films irradiated either at the room temperature, or at the high temperature of 150 degrees C. Moreover, an evolution model was proposed to reveal the effect of dual additives on the structure of Ta2O5 films. This study was conducive to a better understanding of the fundamental laser damage mechanism and exploring the potential application of sol-gel films in high temperature environment.

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Laser-induced damage threshold at different wavelengths of Ta 2O5 films annealed over a wide temperature range

Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Nanosecond Laser-Induced Damage at Different Initial Temperatures of Ta2o5 Films Prepared by Dual Ion Beam Sputtering

Temperature Dependences of Optical Properties, Chemical Composition, Structure, and Laser Damage in Ta 2 O 5 Films

Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods

Laser-induced damage of Ta 2 O 5 films obtained from TaCl 5 precursor and annealed at different temperatures

Effects of Different Post-Treatment Methods on Optical Properties, Absorption and Nanosecond Laser-Induced Damage Threshold of Ta2O5 Films

Effects of Deposition Parameters on Laser-Induced Damage Threshold of Ta2O5 Films

Comparison of Laser-Induced Damage in Ta2o5 and Nb2o5 Single-Layer Films and High Reflectors

Study of Optic and Laser-Induced Damage Properties of Ta2O5 Films Deposited by Different Process Parameters

Effect of Oxygen Vacancy on the Band Gap and Nanosecond Laser-Induced Damage Threshold of Ta2o5 Films

Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation

Comparative Studies on the Laser Damage Resistance of Ta2o5 and Nb2o5 Films Performed under Different Electron Beam Currents

Preparation of High Laser-Induced Damage Threshold Ta2O5 Films

In-situ High Temperature Laser-Induced Damage of Sol-Gel Ta2O5 Films with Different Dual Additives

Interfacial Damage in a Ta_2O_5/SiO_2 Double Cavity Filter Irradiated by 1064 Nm Nanosecond Laser Pulses

Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives

Laser-induced Damage of TiO2∕SiO2 High Reflector at 1064Nm

Laser-Induced Damage Threshold of Tio2 Films with Different Preparation Methods and Annealing Temperatures