Abstract:y Using TaCl5 as the precursor, two types of Ta2O5 sols were synthesized with employment of different dual additives, namely, diethanolamine (DEA) with acetylacetone and DEA with polyethylene glycol (PEG). The prepared sol-gel Ta2O5 films were featured by the low surface roughness, high transmittance, low absorption and high laser-induced damage threshold (LIDT). The highest LIDT of 29.1 J/cm(2) was obtained in the film prepared with the DEA and PEG additives. This should be attributed to the chelation effect of DEA and the steric hindrance imposed by PEG, which synergistically resulted in a more regular three-dimensional network structure and consequently lower film internal defects. In the case of temperature increase to 150 degrees C, the LIDT levels of both the films decreased. The damage morphologies indicated the defect-induced mechanism for the films irradiated either at the room temperature, or at the high temperature of 150 degrees C. Moreover, an evolution model was proposed to reveal the effect of dual additives on the structure of Ta2O5 films. This study was conducive to a better understanding of the fundamental laser damage mechanism and exploring the potential application of sol-gel films in high temperature environment.

Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods

Researches on Laser Damage Resistance of Optical Films

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Effects of Different Post-Treatment Methods on Optical Properties, Absorption and Nanosecond Laser-Induced Damage Threshold of Ta2O5 Films

Laser-induced damage threshold at different wavelengths of Ta 2O5 films annealed over a wide temperature range

Nanosecond Laser-Induced Damage at Different Initial Temperatures of Ta2o5 Films Prepared by Dual Ion Beam Sputtering

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Effects of Deposition Parameters on Laser-Induced Damage Threshold of Ta2O5 Films

Laser-Induced Damage Threshold of Tio2 Films with Different Preparation Methods and Annealing Temperatures

Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation

In-situ High Temperature Laser-Induced Damage of Sol-Gel Ta2O5 Films with Different Dual Additives

Preparation of High Laser-Induced Damage Threshold Ta2O5 Films

Study of Optic and Laser-Induced Damage Properties of Ta2O5 Films Deposited by Different Process Parameters

Comparative Studies on the Laser Damage Resistance of Ta2o5 and Nb2o5 Films Performed under Different Electron Beam Currents

Temperature Dependences of Optical Properties, Chemical Composition, Structure, and Laser Damage in Ta 2 O 5 Films

Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives

Influence of Porosity on Laser Damage Threshold of Sol–gel ZrO2 and SiO2 Monolayer Films

Effect of Oxygen Vacancy on the Band Gap and Nanosecond Laser-Induced Damage Threshold of Ta2o5 Films

Laser-induced damage of Ta 2 O 5 films obtained from TaCl 5 precursor and annealed at different temperatures

Comparison of Laser-Induced Damage in Ta2o5 and Nb2o5 Single-Layer Films and High Reflectors