Abstract:Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressive stress, which results in severe wavefront deformation of optical elements. Annealing post-treatment has been widely used to control the residual stress of optical coatings. However, the effect of annealing on the stress of Ta2O5 films deposited by the IBS method has not been reported in detail. In this study, different thicknesses of Ta2O5 films were deposited by IBS and annealed at different temperatures from 473 to 973 K in air, and the effect of annealing on the stress of Ta2O5 films was investigated. The as-deposited Ta2O5 films deposited by IBS show high compressive stress, which are about 160 MPa. The compressive stress decreases linearly with the increasing temperature, and the wavefront deformation of Ta2O5 films increases linearly with film thickness (within 20 μm) at the same annealing temperature. When the temperature rises to 591 K, Ta2O5 films with zero-stress can be obtained. Ta2O5 films show tensile stress instead of compressive stress with further increasing annealing temperature, and the tensile stress increases with increasing temperature. Meanwhile, with the increasing annealing temperature, the refractive index of Ta2O5 film decreases, indicating the decreasing packing density. The atomic force microscope (AFM) test results show that surface roughness of Ta2O5 films slowly increases with the increasing of annealing temperature. Moreover, X-ray photoelectron spectroscopy (XPS) analysis shows that the Ta in Ta2O5 films can be further oxidized with increasing annealing temperature, namely, the absorption of Ta2O5 film can be reduced. X-ray diffraction (XRD) analysis shows that the annealing temperature should be below 923 K to maintain the amorphous structure of the Ta2O5 film.

Effects of Different Post-Treatment Methods on Optical Properties, Absorption and Nanosecond Laser-Induced Damage Threshold of Ta2O5 Films

Researches on Laser Damage Resistance of Optical Films

Comparative Studies on the Laser Damage Resistance of Ta2o5 and Nb2o5 Films Performed under Different Electron Beam Currents

Nanosecond Laser-Induced Damage at Different Initial Temperatures of Ta2o5 Films Prepared by Dual Ion Beam Sputtering

Effects of Deposition Parameters on Laser-Induced Damage Threshold of Ta2O5 Films

Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods

Temperature Dependences of Optical Properties, Chemical Composition, Structure, and Laser Damage in Ta 2 O 5 Films

Effect of Oxygen Vacancy on the Band Gap and Nanosecond Laser-Induced Damage Threshold of Ta2o5 Films

Study of Optic and Laser-Induced Damage Properties of Ta2O5 Films Deposited by Different Process Parameters

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Laser-induced damage threshold at different wavelengths of Ta 2O5 films annealed over a wide temperature range

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Laser-induced damage of Ta 2 O 5 films obtained from TaCl 5 precursor and annealed at different temperatures

Effects of Oxygen Flows on Optical Properties, Micro-Structure and Residual Stress of Ta 2 O 5 Films Deposited by DIBS

Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation

Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives

Laser-Induced Damage Threshold of Tio2 Films with Different Preparation Methods and Annealing Temperatures

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector

Comparison of Laser-Induced Damage in Ta2o5 and Nb2o5 Single-Layer Films and High Reflectors

Effects of Annealing on Residual Stress in Ta2O5 Films Deposited by Dual Ion Beam Sputtering