Abstract:TiO2 films were prepared using a very stable sol with two additives of diethanolamine (DEA) and polyethylene glycol (PEG) and remained intact without carbonization and cracking at high annealing temperature. It was shown that the laser-induced damage threshold (LIDT) at the wavelength of 1064 nm and the effective pulse duration of 12 ns of the films decreased with the annealing temperature increase. Because of the three-dimensional network structure and the low defect density, the annealing temperature of 353 K led to the highest LIDT of 14.3 J/cm(2). After annealed at 423 K, the ordered film structure was damaged to some extent and the inner defects emerged, contributing to the slight reduce of LIDT. Continually, the increasing annealing temperature of 523 K resulted in the gradual increase of the defect density and surface roughness and the significant decrease of the LIDT. When the annealing temperature increased further to 623 K, the film surface became much rougher, and more defects including the grain boundaries and the holes appeared which caused the lowest LIDT. According to the LIDT results and damage morphologies, a structure evolution model of the films at different temperatures was proposed.

Temperature Dependences of Optical Properties, Chemical Composition, Structure, and Laser Damage in Ta 2 O 5 Films

Laser-induced damage threshold at different wavelengths of Ta 2O5 films annealed over a wide temperature range

Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Effects of Deposition Parameters on Laser-Induced Damage Threshold of Ta2O5 Films

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Laser-induced damage of Ta 2 O 5 films obtained from TaCl 5 precursor and annealed at different temperatures

Nanosecond Laser-Induced Damage at Different Initial Temperatures of Ta2o5 Films Prepared by Dual Ion Beam Sputtering

Effect of annealing on the optical properties of Ta2O5 films prepared by electron beam evaporation

Effects of Different Post-Treatment Methods on Optical Properties, Absorption and Nanosecond Laser-Induced Damage Threshold of Ta2O5 Films

Effect of Oxygen Vacancy on the Band Gap and Nanosecond Laser-Induced Damage Threshold of Ta2o5 Films

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Effect of Temperature Fields on Optical Properties of La2Ti2O7 Thin Films

Study of Optic and Laser-Induced Damage Properties of Ta2O5 Films Deposited by Different Process Parameters

Annealing effects on the optical and electrochemical properties of tantalum pentoxide films

Effects of Deposition Temperature on Structural, Optical Properties and Laser Damage of LaTiO3 Thin Films

Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives

INFLUENCE OF DEPOSITION TEMPERATURE ON OPTICAL AND LASER-INDUCED DAMAGE PROPERTIES OF LaTiO3 FILMS

Electrical characterization of Ta2O5 films deposited by laser reactive ablation of metallic Ta

Annealing effect of the optical properties of tantalum oxide thin film prepared by ion beam sputtering

Study on the relationship between laser-induced damage threshold and microscopic properties of Ta2O5 films by the combination of experiment and simulation