Abstract:Laser damage in films under long-term high-temperature conditions is a significant concern for advancing laser applications. This study focused on HfO2 films prepared using the sol–gel method with HfCl4 as a precursor. It examined the effects of temperature on various properties of the films, including their optical properties, microstructure, surface morphology, absorption, and laser-induced damage threshold (LIDT). The prepared film demonstrated desirable characteristics at the high temperature of 423 K, such as high transmittance, low absorption, and high LIDT. As the duration of its high-temperature exposure increased, the LIDT of the films gradually decreased. An intriguing finding was that the film's LIDT exhibited an exponential decay pattern with prolonged heating time. This observation could be attributed to the power-law increase in defects on both the internal and surface areas of the film as the duration of high-temperature exposure lengthened. Moreover, even after a 15-day heating period at 423 K, the film maintained an LIDT of 12.9 J/cm2, indicating its potential applicability in practical high-temperature environments. This study provided a general pattern and a universal formula for understanding the laser damage of sol–gel films at high temperatures over time. Furthermore, it opened possibilities for future developments of laser films suitable for extreme environments.

In-situ High Temperature Laser-Induced Damage of Sol-Gel Ta2O5 Films with Different Dual Additives

Preparation of High Laser-Induced Damage Threshold Ta2O5 Films

Exploration of the key parameters in sol-gel preparation of Ta2O5 films with high laser damage resistance

Preparation of High Laser-Induced Damage Threshold Sol-Gel Nb2O5 Films with Different Additives

Influencing factors in the laser-induced damage threshold of Ta2O5 films prepared with different methods

Preparation of Sol-Gel ZrO2 Films with High Laser-Induced Damage Threshold under High Temperature

Laser-Induced Damage Threshold of Tio2 Films with Different Preparation Methods and Annealing Temperatures

Temperature effect on the nanosecond laser-induced damage of TiO2 films with two additives

Laser-induced damage threshold at different wavelengths of Ta 2O5 films annealed over a wide temperature range

Nanosecond Laser-Induced Damage at Different Initial Temperatures of Ta2o5 Films Prepared by Dual Ion Beam Sputtering

Laser-Induced Damage Threshold At Different Wavelengths Of Ta2o5 Films Of Wide-Range Temperature Annealing

Temperature Dependences of Optical Properties, Chemical Composition, Structure, and Laser Damage in Ta 2 O 5 Films

Laser-induced damage of Ta 2 O 5 films obtained from TaCl 5 precursor and annealed at different temperatures

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Time-Dependent Resistance of Sol–Gel HfO2 Films to In Situ High-Temperature Laser Damage

Increased Laser-Damage Resistance of Sol–Gel Silica Coating by Structure Modification

Effects of Different Post-Treatment Methods on Optical Properties, Absorption and Nanosecond Laser-Induced Damage Threshold of Ta2O5 Films

Laser-induced damage mechanism of the sol–gel single-layer SiO2 acid and base thin films

Improvement on Laser-Induced Damage Threshold of Sol-Gel ZrO_2 Coatings by Crystal Structure Tuning

Preparation of Transmissive Optics Coated by Sol-gel Method With High Laser-induced Damage Threshold