Abstract:Laser-induced damage on fused silica optics remains a major issue that limits the promotion of energy output of large laser systems. Subsurface impurity defects inevitably introduced in the practical polishing process incur strong thermal absorption for incident lasers, seriously lowering the laser-induced damage threshold (LIDT). Here, we simulate the temperature and thermal stress distributions involved in the laser irradiation process to investigate the effect of impurity defects on laser damage resistance. Then, HF-based etchants (HF:NH4F) are applied to remove the subsurface impurity defects and the surface quality, impurity contents and laser damage resistance of etched silica surfaces are tested. The results indicate that the presence of impurity defects could induce a dramatic rise of local temperature and thermal stress. The maximum temperature and stress can reach up to 7073 K and 8739 MPa, respectively, far higher than the melting point and compressive strength of fused silica, resulting in serious laser damage. The effect of impurity defects on laser damage resistance is dependent on the species, size and spatial location of the defects, and CeO2 defects play a dominant role in lowering the LIDT, followed by Fe and Al defects. CeO2 defects with radius of 0.3 μm, which reside 0.15 μm beneath the surface, are the most dangerous defects for incurring laser damage. By HF acid etching, the negative effect of impurity defects on laser damage resistance could be effectively mitigated. It is validated that with HF acid etching, the number of dangerous CeO2 defects is decreased by more than half, and the LIDT could be improved to 27.1 J/cm2.

Interfacial Damage in a Ta_2O_5/SiO_2 Double Cavity Filter Irradiated by 1064 Nm Nanosecond Laser Pulses

Investigation on Nano-Absorbing Precursors in the Picosecond Regime Via the Comparative Study of HfO2/SiO2 and Ta2O5/SiO2 High-Reflectivity Coating Damage

Laser Damage Mechanisms of Amorphous Ta2o5 Films at 1064, 532 and 355 Nm in One-On-One Regime

Effect of nanosecond laser pre-irradiation on the femtosecond laser-induced damage of Ta2O5/SiO2 high reflector

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Damage Performance of TiO2/SiO2 Thin Film Components Induced by a Long-Pulsed Laser

Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 Nm

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Effect of Polishing-Induced Subsurface Impurity Defects on Laser Damage Resistance of Fused Silica Optics and Their Removal with Hf Acid Etching

Laser Induced Damage Threshold at 355 and 1064 Nm of Ta 2 O 5 Films of Different Phases

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Surface Molecular Structure Defects and Laser-Induced Damage Threshold of Fused Silica During a Manufacturing Process

Incident Laser Modulation of a Repaired Damage Site with a Rim in Fused Silica Rear Subsurface

Laser-induced Damage of TiO2∕SiO2 High Reflector at 1064Nm

Laser-damage Growth Characteristics of Fused Silica under 1064- and 532-Nm Laser Irradiation

Annealing Effects on Microstructure and Laser-Induced Damage Threshold of Quasi-Rugate Filters.

Characterization of laser damage performance of fused silica using photothermal absorption technique

The Photo-Thermal Absorbing Influence on Introducing Laser-Damaging of the Fused Silica

Femtosecond Laser Pulse Induced Damage In Thin Films - Art. No. 60281d