Experimental Demonstration of Deeply-Etched SiO<formula formulatype="inline"><tex Notation="TeX">$_{2}$</tex></formula> Ridge Optical Waveguides and Devices

Zhen Sheng,Bo Yang,Liu Yang,Jing Hu,Daoxin Dai,Sailing He
DOI: https://doi.org/10.1109/JQE.2009.2023610
IF: 2.5
2010-01-01
IEEE Journal of Quantum Electronics
Abstract:Deeply-etched SiO2 optical ridge waveguides are fabricated and characterized. A detailed discussion of the fabrication process (especially for the deep etching process) is presented. The measured propagation losses for the fabricated waveguides with different core widths range from 0.33 ~ 0.81 dB/mm. The loss is mainly caused by the scattering due to the sidewall roughness. The losses in bending s...
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