The character of Mo-MoSi2 gradient material layer made by ihrigizing

Yungang Li,Zhihui Li,Ruixin Ma,Shixian Xian Zhang,Guozhang Tang,Jinglong Liang
DOI: https://doi.org/10.3321/j.issn:1002-185x.2008.11.024
2008-01-01
Rare Metal Materials and Engineering
Abstract:Mo-MoSi2 gragient material is made by ihrigizing, on Mo basal body, using the silicon electrodeposited in KCl-NaCl-NaF-(SiO2) system as silicon source. The character of gradient layer is analyzed by experimental result and theoretical calculation. The results are as following. The silicon content in gradient layer appears three changing regularity. The silicon content declines rapidly along depth in approaching gradient layer surface. The silicon content is almost invariable in middle section of gradient layer. The declining rate of silicon content is slow comparatively in the section near Mo basal body. The gradient layer made up of Mo+Mo3Si+Mo5Si3 is more thick than that of else. The changing regular pattern of gradient layer substance composition along Mo basal body to gradient layer surface is Mo -> Mo5Si3+Mo3Si+Mo -> Mo5Si3+MoSi2 -> MoSi2 and the rate of each substance content changes with silicon content.
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