Micromorphology evolution, growth mechanism, and oxidation behaviour of the silicon-rich MoSi 2 coating at 1200 °C in air

Tao Fu,Yingyi Zhang,Luyu Chen,Fuqiang Shen,Junjie Zhu
DOI: https://doi.org/10.1016/j.jmrt.2024.01.112
IF: 6.267
2024-01-20
Journal of Materials Research and Technology
Abstract:The silicon-rich MoSi 2 coating with a submicron surface roughness is deposited on Mo substrate by the hot-dip silicon (HDS) plating process. The microstructure, phase composition, and growth mechanism of the silicon-rich MoSi 2 coating are characterized. The oxidation kinetics and oxidation mechanism of the coated samples and bare Mo at 1200 °C are also analyzed and compared. The results indicate that the silicon-rich MoSi 2 coating is comprised of Si outermost layer, MoSi 2 intermediate layer and Mo 5 Si 3 interface layer. The coating has a high surface silicon concentration and a dense structure, and the average surface roughness (RSa) is only 0.248 μm. After exposed at 1200 °C for 20 h, the per unit area weight change rate (M c ) of the coating is only 0.183 mg/cm 2 and the thickness of oxide layer is 6.72 μm. The smooth surface, compact structure and excellent self-healing ability of the silicon-rich coating ensure its outstanding antioxidant.
materials science, multidisciplinary,metallurgy & metallurgical engineering
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