Measurement of Device Surface Profile and Roughness

LI Xi-de,SHI Hui-Ji
2006-01-01
Abstract:The important methods on the measurement of surface height fluctuation,ranged from millimeter to sub-nanometer,are introduced with the parameters of profile and roughness based on the optical and scanning microscopic techniques.Topics include the structured light intensity pattern profilometry,the coherence profilometry,as well as the optical scattering and microscopic scanning methods which are applicable to the height fluctuations from centimeters to micrometers,from millimeters to sub-micrometers and from sub-micrometers to sub-nanometers respectively.The characterization mode and measured parameters in various height scales are discussed.Finally,the stress corrosion experiments are carried out to test the roughness change of an aluminum alloy(roughness change from 0.025μm to 0.7μm) and the relationship between the surface roughness and the temperature of the corrosion solution and corrosion time is presented using local speckle intensity average and speckle autocorrelation methods respectively.
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