Abstract:Electron diffraction through a thin patterned silicon membrane can be used to create complex spatial modulations in electron distributions. By precisely varying parameters such as crystallographic orientation and wafer thickness, the intensity of reflections in the diffraction plane can be controlled and by placing an aperture to block all but one spot, we can form an image with different parts of the patterned membrane, as is done for bright-field imaging in microscopy. The patterned electron beams can then be used to control phase and amplitude of subsequent x-ray emission, enabling novel coherent x-ray methods. The electrons themselves can also be used for femtosecond time resolved diffraction and microscopy. As a first step toward patterned beams, we demonstrate experimentally and through simulation the ability to accurately predict and control diffraction spot intensities. We simulate MeV transmission electron diffraction patterns using the multislice method for various crystallographic orientations of a single crystal Si(001) membrane near beam normal. The resulting intensity maps of the Bragg reflections are compared to experimental results obtained at the Accelerator Structure Test Area Ultrafast Electron Diffraction (ASTA UED) facility at SLAC. Furthermore, the fraction of inelastic and elastic scattering of the initial charge is estimated along with the absorption of the membrane to determine the contrast that would be seen in a patterned version of the Si(001) membrane.

Simulation of X-ray diffraction of multilayers with Cantor sequences

Effect Of Thickness Ratio Deviation On Soft-X-Ray Diffraction Of Multilayers

X-ray Diffraction of Multilayers with a Systematic Deviation of Period

X-ray Diffraction Studies of Trilayer Oscillations in the Preferred Thickness of in Films on Si(111)

Influence of period deviation on soft x-ray diffraction of multilayers

Simultaneous Bragg Diffraction of X-rays from Liquid-Phase Epitaxial Thin Films

Simultaneous Determination of Tensile and Shear Strains of Crystalline Bilayers Using Three Bragg Reflections of X-rays

SMALL-ANGLE X-RAY DIFFRACTION STUDY OF AMORPHOUS MULTILAYER AND SINGLE LAYER THIN FILMS

Precise Calculation of the Periodic-thickness for Multilayer

Extending the Takagi-Taupin equations for x-ray nanobeam Bragg coherent diffraction

Triple layer superlattice in binary mixtures of very long n-alkanes: a study by SAXS

Diffraction Behaviour of Three-Component Fibonacci Ta/Al Multilayer Films

Simulation and Study of Diffraction Properites for One- dimensional Material Structures

Multifractal analysis for Cu/Ti bilayer thin films

An Algorithm for Calculating Diffraction Profiles of 2θ Scans for Multiple Diffraction from Crystals and Thin Films

Intensity Modulation of Glancing Angle X-Ray Diffraction Spectra of GexSi1−x/Si Superlattices

Universal simulation of absorption effects for X-ray diffraction in reflection geometry

Effect of antiphase domain boundaries on microdiffraction computer simulation

On the Theory of Diffraction of Limited Synchrotron Radiation Beams in Single Crystal in the Laue Case

Quantitative Agreement Between Dynamical Rocking Curves in Ultrafast Electron Diffraction for X-Ray Lasers.

Depth profiles of the interfacial strains of Si 0.7 Ge 0.3 /Si using three-beam Bragg-surface diffraction