Abstract:Nickel (Ni) induced crystallization of amorphous silicon (a-Si) has been studied by selective deposition of Ni on a-Si thin films. The a-Si under and near the Ni-covered regions was found to be crystallized after heat treatment at 500 °C from 1 to 90 h. Micro-Auger electron spectroscopy revealed that a large amount of Ni stayed in the region under the original Ni coverage, but no Ni was detected either in the crystallized region next to the Ni coverage or in the amorphous region beyond the front of the laterally crystallized Si. X-ray photoelectron spectroscopy revealed a nonuniform Ni distribution through the depth of the crystallized film under the original Ni coverage. In particular, a Ni concentration peak was found to exist at the interface of the crystallized Si and the buried oxide. It was found that a layer of 5-nm-thick Ni could effectively induce lateral crystallization of over 100 μm of a-Si, but the lateral crystallization rate was found to decrease upon extended heat treatment. Transmission electron microscopy analysis showed that the crystallized film under the Ni coverage was composed of randomly oriented fine grains, while that outside the Ni coverage was mainly composed of large (110)-oriented grains. A unified mechanism is proposed to explain the Ni induced crystallization of a-Si and possible reasons for the reduction in the lateral crystallization rate are discussed.

In Situ X-ray Diffraction Analysis on the Crystallization of Amorphous Ti–Ni Thin Films

Nickel Induced Crystallization of Amorphous Silicon Thin Films

The crystallization kinetics of amorphous Ti-rich NiTi film

In-Situ Tem Study of the Thickness Impact on the Crystallization Features of A Near Equal-Atomic Tini Thin Film Prepared by Planar Magnetron Sputtering

In Situ Synchrotron X-ray Diffraction Analysis of Deformation Behaviour in Ti-Ni-based Thin Films.

Crystallization Kinetics of NixTi1−x Alloy Thin Films

Crystallization Kinetics of Amorphous Niti Shape Memory Alloy Thin Films

The Characterization of Crystalline Particle Growth in Tini Thin Films

Crystallization behavior of Ti50Ni25Cu25 amorphous alloy

The Behavior of Crystalline Grain Growth in TiNi Shape Memory Alloy Thin Films

Grain Size Estimations of Annealed Ti–Ni Shape Memory Thin Films

Effect of Annealing Temperature on Surface Morphology and Mechanical Properties of Sputter-Deposited Ti–Ni Thin Films

The effect of the underlying substrate on crystallization kinetics of TiNi thin films

Crystallization of Amorphous NiTiCu Thin Films

Crystallization Properties and Structural Evolution of Amorphous Ti-doped Sn20Sb80 Thin Layers Induced by Heating and Irradiating

Crystallization Kinetics and Martensitic Transformation of Ti49Ni46.5Ce4.5 Alloy Thin Film

Crystallization Kinetics of a Bulk Amorphous Cu–Ti–Zr–Ni Alloy Investigated by Differential Scanning Calorimetry

Crystallization behavior of amorphous phase in the Ti-Ni-Ta surface alloy synthesized on TiNi substrate by electron-beam method

Crystallization Kinetics of Niti Films with Different Ni Contents

Crystallization Kinetics of Ni51mn36sn13 Free-Standing Alloy Thin Films

Crystallization and Microstructural Evolution of an Amorphous Ni–Ti–Hf Film