Intense 310 Am Ultraviolet Emission from Porous Silicon Prepared by Hydrothermal Etching

WANG Xiu-li,FENG Zhao-chi,SHI Jian-ying,LI Can
DOI: https://doi.org/10.13883/j.issn1004-5929.2010.04.001
2010-01-01
Abstract:Porous silicon was prepared with hydrothermal etching method.Porous silicon exhibits the 310 nm intense ultraviolet emission with 244 nm laser excitation.The ultraviolet emission disappears gradually with the ground time increasing,because of the damage of the structure of porous silicon.The transformation from silicon to silica also makes the disappearance of the ultraviolet emission.The 310 nm ultraviolet emission is assigned to the radiative recombination via direct band gap transition between electrons and holes in nanosized silicon.
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